TY - JOUR
T1 - Overdense Plasma Production Using Electron Cyclotron Waves
AU - Tanaka, Masayoshi
AU - Nishimoto, Ryuji
AU - Higashi, Seiichiro
AU - Harada, Nobuhiro
AU - Ohi, Takeshi
AU - Komori, Akio
AU - Kawai, Yoshinobu
N1 - Copyright:
Copyright 2016 Elsevier B.V., All rights reserved.
PY - 1991/5
Y1 - 1991/5
N2 - The density limit in ECR plasma production is overcome using electron cyclotron waves. The plasma of 3 x 1013 cm-3 density is achieved by parallel injection of circularly polarized microwaves with a frequency 2.45 GHz, corresponding to a 400 times higher density than ordinary mode cutoff. It is found that the plasma is produced in the high field side region between the incident position and the ECR point, and this is due to the generation of high energy electrons and the Doppler-shifted cyclotron resonance.
AB - The density limit in ECR plasma production is overcome using electron cyclotron waves. The plasma of 3 x 1013 cm-3 density is achieved by parallel injection of circularly polarized microwaves with a frequency 2.45 GHz, corresponding to a 400 times higher density than ordinary mode cutoff. It is found that the plasma is produced in the high field side region between the incident position and the ECR point, and this is due to the generation of high energy electrons and the Doppler-shifted cyclotron resonance.
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U2 - 10.1143/JPSJ.60.1600
DO - 10.1143/JPSJ.60.1600
M3 - Article
AN - SCOPUS:0010259496
SN - 0031-9015
VL - 60
SP - 1600
EP - 1607
JO - Journal of the Physical Society of Japan
JF - Journal of the Physical Society of Japan
IS - 5
ER -