Phase transformation and nanograin refinement of silicon by processing through high-pressure torsion

Yoshifumi Ikoma, Kazunori Hayano, Kaveh Edalati, Katsuhiko Saito, Qixin Guo, Zenji Horita

研究成果: ジャーナルへの寄稿学術誌査読

48 被引用数 (Scopus)

抄録

Si(100) wafers were subjected to severe plastic deformation under a pressure of 24 GPa using high-pressure torsion (HPT). Si wafers were plastically deformed at room temperature. HPT-processed samples were composed of metastable body centered cubic Si-III and rhombohedral Si-XII phases in the initial cubic diamond Si-I. The volume fraction of metastable phases increased with increasing plastic strain. Successive annealing at 873 K led to the reverse transformation of metastable phases. A broad photoluminescence peak centered at about 650 nm appears due to the reverse transformation of Si-III/Si-XII nanograins and the reduction of number of defects in Si-I nanograins.

本文言語英語
論文番号121908
ジャーナルApplied Physics Letters
101
12
DOI
出版ステータス出版済み - 9月 17 2012

!!!All Science Journal Classification (ASJC) codes

  • 物理学および天文学(その他)

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