Photolithographically constructed single ZnO nanowire device and its ultraviolet photoresponse

Quanli Liu, Takao Yasui, Kazuki Nagashima, Takeshi Yanagida, Masafumi Horiuchi, Zetao Zhu, Hiromi Takahashi, Taisuke Shimada, Akihide Arima, Yoshinobu Baba

研究成果: ジャーナルへの寄稿学術誌査読

6 被引用数 (Scopus)

抄録

A sparse ZnO nanowire array with aspect ratio of ca. 120 and growth rate of 1 [im/h was synthesized by controlling the density of seeds at the initial stage of nanowire growth. The spatially-separated nanowires were cut off from the growth substrate without breaking, and thus were useful in the construction of a single-nanowire device by photolithography. The device exhibited a linear current-voltage characteristic associated with ohmic contact between ZnO nanowire and electrodes. The device further demonstrated a reliable photoresponse with an Luv/Idark of ~100 to ultraviolet light irradiation.

本文言語英語
ページ(範囲)1125-1129
ページ数5
ジャーナルanalytical sciences
36
9
DOI
出版ステータス出版済み - 9月 1 2020

!!!All Science Journal Classification (ASJC) codes

  • 分析化学

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