Physical properties of fe3si films coated through facing targets sputtering after microwave plasma treatment
Nattakorn Borwornpornmetee, Peerasil Charoenyuenyao, Rawiwan Chaleawpong, Boonchoat Paosawatyanyong, Rungrueang Phatthanakun, Phongsaphak Sittimart, Kazuki Aramaki, Takeru Hamasaki, Tsuyoshi Yoshitake, Nathaporn Promros
研究成果: ジャーナルへの寄稿 › 学術誌 › 査読
2
被引用数
(Scopus)