Plasma etching of single fine particle trapped in Ar plasma by optical tweezers

T. Ito, K. Koga, D. Yamashita, K. Kamataki, N. Itagaki, G. Uchida, M. Shiratani

研究成果: ジャーナルへの寄稿会議記事査読

5 被引用数 (Scopus)

抄録

Physical and chemical interactions between plasmas and nano-featured surfaces are one important issue in the plasma processing. Here we optically trap single fine particle levitated at plasma/sheath boundary with an infrared laser to realize in-situ analysis of such interactions. We have measured time evolution of the diameter of the single fine particle in Ar plasma. The trapped particle was etched at an etching rate of 1 nm/min in Ar plasma. We also obtained a Raman peak at around 2950 cm-1 corresponding to C-H bonds in the single fine particle in Ar plasma. The results open a new possibility to observe directly interactions between plasma and single fine particle.

本文言語英語
論文番号012014
ジャーナルJournal of Physics: Conference Series
518
1
DOI
出版ステータス出版済み - 2014
イベント26th Symposium on Plasma Sciences for Materials, SPSM 2013 - Fukuoka, 日本
継続期間: 9月 23 20139月 24 2013

!!!All Science Journal Classification (ASJC) codes

  • 物理学および天文学(全般)

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