Polarity effect on the behavior of gas-puff z-pinch plasma produced by IPP system

K. Imasaka, Koji Takahashi, Junya Suehiro, M. Hara

研究成果: 著書/レポートタイプへの貢献会議での発言

抄録

Hot spots produced by gas-puff z-pinch plasma which are high energy density plasma regions radiate intensive soft x-rays. Gas-puff z-pinch is expected to industrial applications such as soft x-ray lithography, microscopy and laser. In these cases, the scattering of hot spots is important when the gas-puff z-pinch plasma is used as a point source of soft x-ray. Previous results in our study showed the reduction of radial displacement of hot spots in positive voltage shots by using an IPP (Inductive Pulsed Power) system. In this paper, the voltage polarity effects on the gaspuff z-pinch plasma behavior, spatial distribution of hot spots and soft x-ray emission are described.

元の言語英語
ホスト出版物のタイトルPPPS 2001 - Pulsed Power Plasma Science 2001
出版者Institute of Electrical and Electronics Engineers Inc.
ページ757-760
ページ数4
1
ISBN(電子版)0780371208, 9780780371200
DOI
出版物ステータス出版済み - 1 1 2015
イベント28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001 - Las Vegas, 米国
継続期間: 6 17 20016 22 2001

その他

その他28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001
米国
Las Vegas
期間6/17/016/22/01

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plasma pinch
polarity
Plasmas
X rays
Gases
gases
x rays
Plasma density
Electric potential
electric potential
Lithography
Spatial distribution
point sources
shot
Industrial applications
Microscopic examination
spatial distribution
lithography
flux density
Scattering

All Science Journal Classification (ASJC) codes

  • Energy Engineering and Power Technology
  • Nuclear Energy and Engineering
  • Nuclear and High Energy Physics

これを引用

Imasaka, K., Takahashi, K., Suehiro, J., & Hara, M. (2015). Polarity effect on the behavior of gas-puff z-pinch plasma produced by IPP system. : PPPS 2001 - Pulsed Power Plasma Science 2001 (巻 1, pp. 757-760). [1002207] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/PPPS.2001.01002207

Polarity effect on the behavior of gas-puff z-pinch plasma produced by IPP system. / Imasaka, K.; Takahashi, Koji; Suehiro, Junya; Hara, M.

PPPS 2001 - Pulsed Power Plasma Science 2001. 巻 1 Institute of Electrical and Electronics Engineers Inc., 2015. p. 757-760 1002207.

研究成果: 著書/レポートタイプへの貢献会議での発言

Imasaka, K, Takahashi, K, Suehiro, J & Hara, M 2015, Polarity effect on the behavior of gas-puff z-pinch plasma produced by IPP system. : PPPS 2001 - Pulsed Power Plasma Science 2001. 巻. 1, 1002207, Institute of Electrical and Electronics Engineers Inc., pp. 757-760, 28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001, Las Vegas, 米国, 6/17/01. https://doi.org/10.1109/PPPS.2001.01002207
Imasaka K, Takahashi K, Suehiro J, Hara M. Polarity effect on the behavior of gas-puff z-pinch plasma produced by IPP system. : PPPS 2001 - Pulsed Power Plasma Science 2001. 巻 1. Institute of Electrical and Electronics Engineers Inc. 2015. p. 757-760. 1002207 https://doi.org/10.1109/PPPS.2001.01002207
Imasaka, K. ; Takahashi, Koji ; Suehiro, Junya ; Hara, M. / Polarity effect on the behavior of gas-puff z-pinch plasma produced by IPP system. PPPS 2001 - Pulsed Power Plasma Science 2001. 巻 1 Institute of Electrical and Electronics Engineers Inc., 2015. pp. 757-760
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