Polarity effect on the behavior of gas-puff z-pinch plasma produced by IPP system

K. Imasaka, K. Takahashi, J. Suehiro, M. Hara

研究成果: 書籍/レポート タイプへの寄稿会議への寄与

抄録

Hot spots produced by gas-puff z-pinch plasma which are high energy density plasma regions radiate intensive soft x-rays. Gas-puff z-pinch is expected to industrial applications such as soft x-ray lithography, microscopy and laser. In these cases, the scattering of hot spots is important when the gas-puff z-pinch plasma is used as a point source of soft x-ray. Previous results in our study showed the reduction of radial displacement of hot spots in positive voltage shots by using an IPP (Inductive Pulsed Power) system. In this paper, the voltage polarity effects on the gaspuff z-pinch plasma behavior, spatial distribution of hot spots and soft x-ray emission are described.

本文言語英語
ホスト出版物のタイトルPPPS 2001 - Pulsed Power Plasma Science 2001
編集者Robert Reinovsky, Mark Newton
出版社Institute of Electrical and Electronics Engineers Inc.
ページ757-760
ページ数4
ISBN(電子版)0780371208, 9780780371200
DOI
出版ステータス出版済み - 2015
イベント28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001 - Las Vegas, 米国
継続期間: 6月 17 20016月 22 2001

出版物シリーズ

名前PPPS 2001 - Pulsed Power Plasma Science 2001
1

その他

その他28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001
国/地域米国
CityLas Vegas
Period6/17/016/22/01

!!!All Science Journal Classification (ASJC) codes

  • エネルギー工学および電力技術
  • 原子力エネルギーおよび原子力工学
  • 核物理学および高エネルギー物理学

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