TY - JOUR
T1 - Polarity effect on the behaviour of gas puff z-pinch plasma produced by IPP system
AU - Imasaka, K.
AU - Takahashi, K.
AU - Suehiro, J.
AU - Hara, M.
N1 - Copyright:
Copyright 2004 Elsevier Science B.V., Amsterdam. All rights reserved.
PY - 2001
Y1 - 2001
N2 - Hot spots produced by gas-puff z-pinch plasma which are high energy density plasma regions radiate intensive soft x-rays. Gas-puff z-pinch is expected to industrial applications such as soft x-ray lithography, microscopy and laser, in these cases, the scattering of hot spots is important when the gas-puff z-pinch plasma is used as a point source of soft x-ray. Previous results in our study showed the reduction of radial displacement of hot spots in positive voltage shots by using IPP(inductive pulsed power) system. In this paper, the voltage polarities effect on the z-pinch plasma behaviour, soft x-ray emission and spatial distribution of hot spots are described.
AB - Hot spots produced by gas-puff z-pinch plasma which are high energy density plasma regions radiate intensive soft x-rays. Gas-puff z-pinch is expected to industrial applications such as soft x-ray lithography, microscopy and laser, in these cases, the scattering of hot spots is important when the gas-puff z-pinch plasma is used as a point source of soft x-ray. Previous results in our study showed the reduction of radial displacement of hot spots in positive voltage shots by using IPP(inductive pulsed power) system. In this paper, the voltage polarities effect on the z-pinch plasma behaviour, soft x-ray emission and spatial distribution of hot spots are described.
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M3 - Conference article
AN - SCOPUS:18544391607
SN - 0730-9244
SP - P1C18
JO - IEEE International Conference on Plasma Science
JF - IEEE International Conference on Plasma Science
T2 - 28th IEEE International Conference on Plasma Science/ 13th IEEE International Pulsed Power Conference
Y2 - 17 June 2001 through 22 June 2001
ER -