Polishing mechanism of glass substrates with its processing characteristics by cerium oxide and manganese oxide slurries

T. Yamazaki, T. K. Doi, Syuhei Kurokawa, S. Isayama, Y. Umezaki, Y. Matsukawa, H. Kono, Y. Akagami, Y. Yamaguchi, Y. Kawase

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

3 被引用数 (Scopus)

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Chemical Compounds

Engineering & Materials Science