Homogeneous deposition of anatase films on titanium (Ti) substrates with sub-micron porous structure was investigated. The deposition was achieved by soaking the films in 15% hydrogen peroxide solution for 1 hour at 300°C followed by heating for 1 hour at 300°C in air. Deposition of the film was found to be affected by the reaction rate but was insensitive to substrate morphology. The results showed that a compact film, rather than a porous film, was formed by too strong reactions.
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