抄録
Homogeneous deposition of anatase films on titanium (Ti) substrates with sub-micron porous structure was investigated. The deposition was achieved by soaking the films in 15% hydrogen peroxide solution for 1 hour at 300°C followed by heating for 1 hour at 300°C in air. Deposition of the film was found to be affected by the reaction rate but was insensitive to substrate morphology. The results showed that a compact film, rather than a porous film, was formed by too strong reactions.
本文言語 | 英語 |
---|---|
ページ(範囲) | 101-106 |
ページ数 | 6 |
ジャーナル | Scripta Materialia |
巻 | 46 |
号 | 1 |
DOI | |
出版ステータス | 出版済み - 1月 2002 |
!!!All Science Journal Classification (ASJC) codes
- 材料科学(全般)
- 凝縮系物理学
- 材料力学
- 機械工学
- 金属および合金