Preparation of high quality nitrogen doped TiO2 thin film as a photocatalyst using a pulsed laser deposition method

Yoshiaki Suda, Hiroharu Kawasaki, Tsuyoshi Ueda, Tamiko Ohshima

研究成果: ジャーナルへの寄稿会議記事査読

199 被引用数 (Scopus)

抄録

Nitrogen doped titanium oxide (TiO2-xNx) photocatalysts, which were reported to be activated by visible light irradiation as well as ultraviolet irradiation, have been prepared by pulsed laser deposition (PLD) method using TiN target in nitrogen/oxygen gas mixture. Crystalline structure, nitrogen states in the lattice, composition and surface morphology were analyzed by using X-ray diffraction, X-ray photoelectron spectroscopy and atomic force microscopy. As the results, it is found that film structure and properties strongly depend on target material and nitrogen concentration ratio in the gas mixture. The materials show anatase structure with nitrogen doped into TiO2 oxygen sites, which leads to band gap narrowing.

本文言語英語
ページ(範囲)162-166
ページ数5
ジャーナルThin Solid Films
453-454
DOI
出版ステータス出版済み - 4月 1 2004
外部発表はい
イベントProceedings of Symposium H on Photonic Processing of Surfaces - Strasbourg, フランス
継続期間: 6月 10 20036月 13 2003

!!!All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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