Preparation of nitrogen-doped titanium oxide thin film using a PLD method as parameters of target material and nitrogen concentration ratio in nitrogen/oxygen gas mixture

Yoshiaki Suda, Hiroharu Kawasaki, Tsuyoshi Ueda, Tamiko Ohshima

研究成果: Contribution to journalArticle査読

77 被引用数 (Scopus)

抄録

Nitrogen-doped titanium oxide photocatalysts, which were reported to be activated by visible light irradiation as well as ultraviolet irradiation, have been prepared by pulsed laser deposition method using Ti, TiO, TiO2 and TiN targets in nitrogen/oxygen gas mixture. As a result, it is found that film properties such as color, crystalline structure and atomic composition rate strongly depend on the target material and nitrogen concentration ratio in the gas mixture. It is also suggested that these films under UV light irradiation exhibit almost the same decomposition ability of methylene blue. However, the photocatalytic activity of the nitrogen-doped TiO2 film prepared using TiN target is higher than that of the other films prepared by Ti, TiO and TiO2 targets under normal fluorescent light irradiation.

本文言語英語
ページ(範囲)337-341
ページ数5
ジャーナルThin Solid Films
475
1-2 SPEC. ISS.
DOI
出版ステータス出版済み - 3 22 2005
外部発表はい

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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