TY - JOUR
T1 - Production Mechanism of a Large-Diameter Uniform Electron Cyclotron Resonance Plasma Generated by a Circular T E 01 Mode Microwave
AU - Hirotsu, Nobuyoshi
AU - Yamaguchi, Toru
AU - Hidaka, Ryota
AU - Tanaka, Masayoshi
AU - Kawai, Yoshinobu
PY - 1994/5
Y1 - 1994/5
N2 - To clarify the production mechanism of a large-diameter uniform electron cyclotron resonance (ECR) plasma generated by a circular TE01 mode microwave experimentally, the wave propagation characteristic in the plasma is measured with an interferometer. It is shown that a microwave introduced into the chamber is transformed mainly into an electron cyclotron wave and then entirely absorbed around the resonance point. Furthermore, it is experimentally proven that the correspondence between the radial distribution of the electric field intensity of injected microwaves and that of waves propagating in plasma may depend on the magnetic field intensity around the injection point. It is also confirmed that it is necessary to optimize the magnetic field configuration to generate a uniform ECR plasma since the absorption region of microwaves is as wide as from ω/ω c e ∼0.65 to adjacent to the resonance point.
AB - To clarify the production mechanism of a large-diameter uniform electron cyclotron resonance (ECR) plasma generated by a circular TE01 mode microwave experimentally, the wave propagation characteristic in the plasma is measured with an interferometer. It is shown that a microwave introduced into the chamber is transformed mainly into an electron cyclotron wave and then entirely absorbed around the resonance point. Furthermore, it is experimentally proven that the correspondence between the radial distribution of the electric field intensity of injected microwaves and that of waves propagating in plasma may depend on the magnetic field intensity around the injection point. It is also confirmed that it is necessary to optimize the magnetic field configuration to generate a uniform ECR plasma since the absorption region of microwaves is as wide as from ω/ω c e ∼0.65 to adjacent to the resonance point.
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U2 - 10.1143/JJAP.33.2712
DO - 10.1143/JJAP.33.2712
M3 - Article
AN - SCOPUS:0028422588
SN - 0021-4922
VL - 33
SP - 2712
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 5R
ER -