Production of a large diameter electron cyclotron resonance plasma using a multislot antenna for plasma application

Yoko Ueda, Masayoshi Tanaka, Shunjiro Shinohara, Yoshinobu Kawai

    研究成果: ジャーナルへの寄稿学術誌査読

    12 被引用数 (Scopus)

    抄録

    An electron cyclotron resonance plasma with large diameter, uniform, and high electron density is produced using a multislot antenna. The uniformity of the plasma is within 5% over 20 cm in diameter. The electron density of the helium plasma in front of a substrate is 7×1010 cm -3, while the electron density without the substrate is higher than the cutoff density for 2.45 GHz. The effect of the magnetic field configuration on plasma uniformity is investigated. Both of the R wave (electron cyclotron wave) and L wave are found to be excited in the plasma.

    本文言語英語
    ページ(範囲)5423-5427
    ページ数5
    ジャーナルReview of Scientific Instruments
    66
    12
    DOI
    出版ステータス出版済み - 1995

    !!!All Science Journal Classification (ASJC) codes

    • 器械工学

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