Production of low electron temperature ECR plasma

Y. Kawai, Naho Itagaki, M. Koga, H. Muta

研究成果: ジャーナルへの寄稿記事

7 引用 (Scopus)

抄録

The experiments and simulations on the control of the plasma parameters are performed using large diameter electron cyclotron resonance (ECR) plasmas. It is found that the plasma parameters are controlled by diluting with N2 gas in the mirror magnetic field. The electron temperature (Te) decreases down to 40% and the electron density (ne) increases up to 80%, respectively, that is, a low Te ECR plasma with high ne is realized. Furthermore, the Te control is attempted by changing the spatial profile of the microwave power absorption. It is observed that Te decreases with changing the power absorption profile that is achieved by changing the external conditions such as incident microwave power, magnetic field configuration, and incident microwave frequency. The production mechanism of an ECR plasma with plasma parameter variable is also discussed.

元の言語英語
ページ(範囲)11-16
ページ数6
ジャーナルSurface and Coatings Technology
193
発行部数1-3 SPEC. ISS.
DOI
出版物ステータス出版済み - 4 1 2005

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Electron cyclotron resonance
Electron temperature
electron cyclotron resonance
electron energy
Plasmas
Microwaves
Magnetic fields
microwaves
magnetic field configurations
Microwave frequencies
temperature control
profiles
microwave frequencies
Temperature control
Carrier concentration
Mirrors
Gases
mirrors
Temperature
gases

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

これを引用

Production of low electron temperature ECR plasma. / Kawai, Y.; Itagaki, Naho; Koga, M.; Muta, H.

:: Surface and Coatings Technology, 巻 193, 番号 1-3 SPEC. ISS., 01.04.2005, p. 11-16.

研究成果: ジャーナルへの寄稿記事

Kawai, Y. ; Itagaki, Naho ; Koga, M. ; Muta, H. / Production of low electron temperature ECR plasma. :: Surface and Coatings Technology. 2005 ; 巻 193, 番号 1-3 SPEC. ISS. pp. 11-16.
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