Properties of the nb thin-film nanobridges prepared by nanometer fabrication process

Yuichi Harada, Nobumitsu Hirose, Yoshinori Uzawa

研究成果: Contribution to journalArticle査読

3 被引用数 (Scopus)

抄録

We describe the properties of Nb thin-film nanobridges fabricated by means of our original nanometer-scale process. Our original nanofabrication techniques include the synthesis of a new electron beam (EB) resist and the use of CBrF3 as an etchant for reactive ion etching (RIE). Fabricated nanobridges have high sensitivity of radiation and high reliability. It is observed that the properties of nanobridges can be changed by varying the bridge length and its thickness. We have also fabricated the series arrays and observed that they operate coherently.

本文言語英語
ページ(範囲)3933-3937
ページ数5
ジャーナルJapanese Journal of Applied Physics
30
12
DOI
出版ステータス出版済み - 12 1991
外部発表はい

All Science Journal Classification (ASJC) codes

  • 工学(全般)
  • 物理学および天文学(全般)

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