Properties of the nb thin-film nanobridges prepared by nanometer fabrication process

Yuichi Harada, Nobumitsu Hirose, Yoshinori Uzawa

研究成果: ジャーナルへの寄稿記事

3 引用 (Scopus)

抄録

We describe the properties of Nb thin-film nanobridges fabricated by means of our original nanometer-scale process. Our original nanofabrication techniques include the synthesis of a new electron beam (EB) resist and the use of CBrF3 as an etchant for reactive ion etching (RIE). Fabricated nanobridges have high sensitivity of radiation and high reliability. It is observed that the properties of nanobridges can be changed by varying the bridge length and its thickness. We have also fabricated the series arrays and observed that they operate coherently.

元の言語英語
ページ(範囲)3933-3937
ページ数5
ジャーナルJapanese Journal of Applied Physics
30
発行部数12
DOI
出版物ステータス出版済み - 12 1991

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Reactive ion etching
Nanotechnology
Electron beams
Radiation
Fabrication
Thin films
fabrication
etchants
nanofabrication
thin films
etching
electron beams
sensitivity
radiation
synthesis
ions

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

これを引用

Properties of the nb thin-film nanobridges prepared by nanometer fabrication process. / Harada, Yuichi; Hirose, Nobumitsu; Uzawa, Yoshinori.

:: Japanese Journal of Applied Physics, 巻 30, 番号 12, 12.1991, p. 3933-3937.

研究成果: ジャーナルへの寄稿記事

Harada, Yuichi ; Hirose, Nobumitsu ; Uzawa, Yoshinori. / Properties of the nb thin-film nanobridges prepared by nanometer fabrication process. :: Japanese Journal of Applied Physics. 1991 ; 巻 30, 番号 12. pp. 3933-3937.
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