Rapid transport of nano-particles in amplitude modulated rf discharges for depositing porous ultra-low-k films

S. Iwashita, M. Morita, K. Koga, M. Shiratani

研究成果: Contribution to journalConference article査読

抄録

We have proposed a novel one-step method for synthesizing nano-particle composite porous low-k films. For the method, nano-particles as nano-building blocks and radicals as adhesives are produced in reactive discharge plasmas; both of them are transported to a substrate; and eventually nano-particles are co-deposited there together with radicals. Size of nano-particles is controlled by the duration of pulse rf discharge; their rapid transport of a velocity more than 60 cm/s is realized by pulse rf discharges with an amplitude modulation (AM) of the discharge voltage. The deposition rate with AM is 0.65 nm/s, which is 7 times as high as that without AM, while dielectric constant k 1.1-1.4 and porosity 60-63% of the films with AM are nearly equal to those without AM. Therefore deposition of porous low-k films using pulse rf discharges with AM is a promising method for increasing the deposition rate without varying the properties of films.

本文言語英語
論文番号062006
ジャーナルJournal of Physics: Conference Series
100
Part 6
DOI
出版ステータス出版済み - 3 27 2008
イベント17th International Vacuum Congress, IVC 2007, 13th International Conference on Surface Science, ICSS 2007 and International Conference on Nanoscience and Technology, ICN+T 2007 - Stockholm, スウェーデン
継続期間: 7 2 20077 6 2007

All Science Journal Classification (ASJC) codes

  • 物理学および天文学(全般)

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