Realization of ultraflat plastic film using dressed-photon-phonon-assisted selective etching of nanoscale structures

Takashi Yatsui, Wataru Nomura, Motoichi Ohtsu

    研究成果: Contribution to journalArticle査読

    4 被引用数 (Scopus)

    抄録

    We compared dressed-photon-phonon (DPP) etching to conventional photochemical etching and, using a numerical analysis of topographic images of the resultant etched polymethyl methacrylate (PMMA) substrate, we determined that the DPP etching resulted in the selective etching of smaller scale structures in comparison with the conventional photochemical etching. We investigated the wavelength dependence of the PMMA substrate etching using an Ogas. As the dissociation energy of Ois 5.12 eV, we applied a continuous-wave (CW) He-Cd laser (λ= 325 nm, 3.81 eV) for the DPP etching and a 5th-harmonic Nd:YAG laser (λ= 213 nm, 5.82 eV) for the conventional photochemical etching. From the obtained atomic force microscope images, we confirmed a reduction in surface roughness, Ra, in both cases. However, based on calculations involving the standard deviation of the height difference function, we confirmed that the conventional photochemical etching method etched the larger scale structures only, while the DPP etching process selectively etched the smaller scale features.

    本文言語英語
    論文番号701802
    ジャーナルAdvances in Optical Technologies
    2015
    DOI
    出版ステータス出版済み - 2015

    All Science Journal Classification (ASJC) codes

    • 電子材料、光学材料、および磁性材料
    • 原子分子物理学および光学

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