Recent trends of moderate-pressure microwave plasma-enhanced CVD from diamond to nanocarbons

研究成果: Contribution to journalReview article査読

抄録

Recent trends of CVD techniques by using moderate-pressure microwave plasmas are reviewed. Microwave plasma sources generate stable and high-density plasmas typically at pressures of 10 to 100 Torr. They have been developed exclusively to deposit artificial diamond films and are increasingly used to deposit nanostructured carbon materials. The deposition mechanism and electrical properties of nanocrystalline diamond films and carbon nanowalls are described.

本文言語英語
ページ(範囲)11-15
ページ数5
ジャーナルIEEJ Transactions on Fundamentals and Materials
131
1
DOI
出版ステータス出版済み - 2011

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

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