Recent trends of moderate-pressure microwave plasma-enhanced CVD from diamond to nanocarbons

Kungen Teii

doi:10.1541/ieejfms.131.11

Recent trends of moderate-pressure microwave plasma-enhanced CVD from diamond to nanocarbons

Kungen Teii

電気理工学

研究成果: Contribution to journal › Review article › 査読

抄録

Recent trends of CVD techniques by using moderate-pressure microwave plasmas are reviewed. Microwave plasma sources generate stable and high-density plasmas typically at pressures of 10 to 100 Torr. They have been developed exclusively to deposit artificial diamond films and are increasingly used to deposit nanostructured carbon materials. The deposition mechanism and electrical properties of nanocrystalline diamond films and carbon nanowalls are described.

本文言語	英語
ページ（範囲）	11-15
ページ数	5
ジャーナル	IEEJ Transactions on Fundamentals and Materials
巻	131
号	1
DOI	https://doi.org/10.1541/ieejfms.131.11
出版ステータス	出版済み - 2011

All Science Journal Classification (ASJC) codes

Electrical and Electronic Engineering

文献へのアクセス

10.1541/ieejfms.131.11

フィンガープリント「Recent trends of moderate-pressure microwave plasma-enhanced CVD from diamond to nanocarbons」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル

@article{3fb4773297a6436081aef591bb465890,

title = "Recent trends of moderate-pressure microwave plasma-enhanced CVD from diamond to nanocarbons",

abstract = "Recent trends of CVD techniques by using moderate-pressure microwave plasmas are reviewed. Microwave plasma sources generate stable and high-density plasmas typically at pressures of 10 to 100 Torr. They have been developed exclusively to deposit artificial diamond films and are increasingly used to deposit nanostructured carbon materials. The deposition mechanism and electrical properties of nanocrystalline diamond films and carbon nanowalls are described.",

author = "Kungen Teii",

year = "2011",

doi = "10.1541/ieejfms.131.11",

language = "English",

volume = "131",

pages = "11--15",

journal = "IEEJ Transactions on Fundamentals and Materials",

issn = "0385-4205",

publisher = "一般社団法人電気学会",

number = "1",

}

TY - JOUR

T1 - Recent trends of moderate-pressure microwave plasma-enhanced CVD from diamond to nanocarbons

AU - Teii, Kungen

PY - 2011

Y1 - 2011

N2 - Recent trends of CVD techniques by using moderate-pressure microwave plasmas are reviewed. Microwave plasma sources generate stable and high-density plasmas typically at pressures of 10 to 100 Torr. They have been developed exclusively to deposit artificial diamond films and are increasingly used to deposit nanostructured carbon materials. The deposition mechanism and electrical properties of nanocrystalline diamond films and carbon nanowalls are described.

AB - Recent trends of CVD techniques by using moderate-pressure microwave plasmas are reviewed. Microwave plasma sources generate stable and high-density plasmas typically at pressures of 10 to 100 Torr. They have been developed exclusively to deposit artificial diamond films and are increasingly used to deposit nanostructured carbon materials. The deposition mechanism and electrical properties of nanocrystalline diamond films and carbon nanowalls are described.

UR - http://www.scopus.com/inward/record.url?scp=79951923865&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79951923865&partnerID=8YFLogxK

U2 - 10.1541/ieejfms.131.11

DO - 10.1541/ieejfms.131.11

M3 - Review article

AN - SCOPUS:79951923865

VL - 131

SP - 11

EP - 15

JO - IEEJ Transactions on Fundamentals and Materials

JF - IEEJ Transactions on Fundamentals and Materials

SN - 0385-4205

IS - 1

ER -