Redox characteristics of thiol compounds using radicals produced by water vapor radio frequency discharge

Nobuya Hayashi; Akari Nakahigashi; Masaaki Goto; Satoshi Kitazaki; Kazunori Koga; Masaharu Shiratani

doi:10.1143/JJAP.50.08JF04

Redox characteristics of thiol compounds using radicals produced by water vapor radio frequency discharge

Nobuya Hayashi, Akari Nakahigashi, Masaaki Goto, Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani

電子デバイス工学

研究成果: Contribution to journal › Article › 査読

16 被引用数 (Scopus)

抄録

The redox reaction between cystein and cystine is observed using radicals produced in water vapor plasma for the control of plant growth. Cystein is oxidized to cystine using the OH radical in the higher-pressure regime and cystine is reduced to cystein by the H radical generated in the lowerpressure regime. Also, the oxidative stress reaction of plants is observed when water vapor plasma is irradiated onto seeds of plants such as radish sprouts. The mechanism of the control of plant growth is explained by the change in thiol compound quantity of the plant cells induced by the radical reaction.

本文言語	英語
論文番号	08JF04
ジャーナル	Japanese journal of applied physics
巻	50
号	8 PART 2
DOI	https://doi.org/10.1143/JJAP.50.08JF04
出版ステータス	出版済み - 8 2011

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

文献へのアクセス

10.1143/JJAP.50.08JF04

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引用スタイル

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abstract = "The redox reaction between cystein and cystine is observed using radicals produced in water vapor plasma for the control of plant growth. Cystein is oxidized to cystine using the OH radical in the higher-pressure regime and cystine is reduced to cystein by the H radical generated in the lowerpressure regime. Also, the oxidative stress reaction of plants is observed when water vapor plasma is irradiated onto seeds of plants such as radish sprouts. The mechanism of the control of plant growth is explained by the change in thiol compound quantity of the plant cells induced by the radical reaction.",

author = "Nobuya Hayashi and Akari Nakahigashi and Masaaki Goto and Satoshi Kitazaki and Kazunori Koga and Masaharu Shiratani",

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T1 - Redox characteristics of thiol compounds using radicals produced by water vapor radio frequency discharge

AU - Hayashi, Nobuya

AU - Nakahigashi, Akari

AU - Goto, Masaaki

AU - Kitazaki, Satoshi

AU - Koga, Kazunori

AU - Shiratani, Masaharu

PY - 2011/8

Y1 - 2011/8

N2 - The redox reaction between cystein and cystine is observed using radicals produced in water vapor plasma for the control of plant growth. Cystein is oxidized to cystine using the OH radical in the higher-pressure regime and cystine is reduced to cystein by the H radical generated in the lowerpressure regime. Also, the oxidative stress reaction of plants is observed when water vapor plasma is irradiated onto seeds of plants such as radish sprouts. The mechanism of the control of plant growth is explained by the change in thiol compound quantity of the plant cells induced by the radical reaction.

AB - The redox reaction between cystein and cystine is observed using radicals produced in water vapor plasma for the control of plant growth. Cystein is oxidized to cystine using the OH radical in the higher-pressure regime and cystine is reduced to cystein by the H radical generated in the lowerpressure regime. Also, the oxidative stress reaction of plants is observed when water vapor plasma is irradiated onto seeds of plants such as radish sprouts. The mechanism of the control of plant growth is explained by the change in thiol compound quantity of the plant cells induced by the radical reaction.

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