Redox characteristics of thiol compounds using radicals produced by water vapor radio frequency discharge

Nobuya Hayashi, Akari Nakahigashi, Masaaki Goto, Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani

研究成果: Contribution to journalArticle査読

16 被引用数 (Scopus)

抄録

The redox reaction between cystein and cystine is observed using radicals produced in water vapor plasma for the control of plant growth. Cystein is oxidized to cystine using the OH radical in the higher-pressure regime and cystine is reduced to cystein by the H radical generated in the lowerpressure regime. Also, the oxidative stress reaction of plants is observed when water vapor plasma is irradiated onto seeds of plants such as radish sprouts. The mechanism of the control of plant growth is explained by the change in thiol compound quantity of the plant cells induced by the radical reaction.

本文言語英語
論文番号08JF04
ジャーナルJapanese journal of applied physics
50
8 PART 2
DOI
出版ステータス出版済み - 8 2011

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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