Polyurethane ultrathin films with two hard segment contents (20 and 45 wt%) were prepared onto a silicon wafer by a spin coating method. The change in the microphase separation of the polyurethane ultrathin films was investigated by atomic force microscope (AFM) and Fourier transform infrared (FT-IR) spectroscopy as a function of film thickness. For the thick film, the domain size was ca. 20 nm, which is almost the same as bulk one. On the other hand, the size of hard segment domains for the ultrathin films decreased with decrease in film thickness. The domain size was ca. 10 nm for the ultrathin film. This seems to be simply related to a decreasing space.
|ホスト出版物のタイトル||54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan|
|出版ステータス||出版済み - 2005|
|イベント||54th SPSJ Annual Meeting 2005 - Yokohama, 日本|
継続期間: 5 25 2005 → 5 27 2005
|その他||54th SPSJ Annual Meeting 2005|
|Period||5/25/05 → 5/27/05|
All Science Journal Classification (ASJC) codes