Relationships between hard segment content and phase separated structure of polyurethane ultrathin films

Yusuke Uchiba, Ken Kojio, Mutsuhisa Furukawa

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

抄録

Polyurethane ultrathin films with two hard segment contents (20 and 45 wt%) were prepared onto a silicon wafer by a spin coating method. The change in the microphase separation of the polyurethane ultrathin films was investigated by atomic force microscope (AFM) and Fourier transform infrared (FT-IR) spectroscopy as a function of film thickness. For the thick film, the domain size was ca. 20 nm, which is almost the same as bulk one. On the other hand, the size of hard segment domains for the ultrathin films decreased with decrease in film thickness. The domain size was ca. 10 nm for the ultrathin film. This seems to be simply related to a decreasing space.

本文言語英語
ホスト出版物のタイトル54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan
ページ1088
ページ数1
54
1
出版ステータス出版済み - 2005
外部発表はい
イベント54th SPSJ Annual Meeting 2005 - Yokohama, 日本
継続期間: 5 25 20055 27 2005

その他

その他54th SPSJ Annual Meeting 2005
国/地域日本
CityYokohama
Period5/25/055/27/05

All Science Journal Classification (ASJC) codes

  • 工学(全般)

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