Removal of thin layer for trace element analysis of solid surface in subnanometer scale using laser-ablation atomic fluorescence spectroscopy

Yuji Oki, Kenji Matsunaga, Takumi Nomura, Mitsuo Maeda

研究成果: Contribution to journalArticle査読

17 被引用数 (Scopus)

抄録

Laser-ablation atomic fluorescence (LAAF) spectroscopy has extremely high sensitivity in the analysis of trace elements. Using the ArF laser-ablation technique at a wavelength of 193 nm, removal of thin surface layer of the order of 1.1 nm/shot for the first 50 shots and 0.4 nm/shot after that is demonstrated for a solid glass sample. A constant fluorescence signal from Na atoms is obtained for each shot. There is a possibility of determining the depth distribution of an element with subnanometer resolution by applying LAAF spectroscopy.

本文言語英語
ページ(範囲)2916-2918
ページ数3
ジャーナルApplied Physics Letters
71
20
DOI
出版ステータス出版済み - 11 17 1997

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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