Responses of organic and inorganic materials to intense EUV radiation from laser-produced plasmas

Tetsuya Makimura, Shuichi Torii, Daisuke Nakamura, Akihiko Takahashi, Tatsuo Okada, Hiroyuki Niino, Kouichi Murakami

研究成果: 著書/レポートタイプへの貢献会議での発言

1 引用 (Scopus)

抄録

We have investigated responses of polymers to EUV radiation from laser-produced plasmas beyond ablation thresholds and micromachining. We concentrated on fabricate precise 3D micro-structures of PDMS, PMMA, acrylic block copolymers (BCP), and silica. The micromachining technique can be applied to three-dimensional micro-fluidic and bio-medical devices. The EUV processing is a promising to realize a practical micromachining technique. In the present work, we used two EUV radiation sources; (a) Wide band EUV light in a range of 10{300 eV was generated by irradiation of Ta targets with Nd:YAG laser light at 500 mJ/pulse. (b) Narrow band EUV light at 11 and 13 nm was generated by irradiation of solid Xe and Sn targets, respectively, with pulsed TEA CO2 laser light. The generated EUV light was condensed onto the materials at high power density beyond the ablation thresholds, using ellipsoidal mirrors. We found that through-holes with a diameter of one micrometer can be fabricated in PMMA and PDMS sheets with thicknesses of 4-10 micrometers, at 250 and 230 nm/shot, respectively. The effective ablation of PMMA sheets can be applied to a LIGA-like process for fabricating micro-structures of metals for micro- and nano-molds. PDMS sheets are ablated if it is irradiated with EUV light beyond a distinct threshold power density, while PDMS surfaces were modified at lower power densities. Furthermore, BCP sheets were ablated to have 1-micrometer structures. Thus, we have developed a practical technique for micromachining of PMMA, PDMS and BCP sheets in a micrometer scale.

元の言語英語
ホスト出版物のタイトルDamage to VUV, EUV, and X-Ray Optics IV; and EUV and X-Ray Optics
ホスト出版物のサブタイトルSynergy Between Laboratory and Space III
DOI
出版物ステータス出版済み - 8 1 2013
イベントDamage to VUV, EUV, and X-Ray Optics IV; and EUV and X-Ray Optics: Synergy Between Laboratory and Space III - Prague, チェコ共和国
継続期間: 4 15 20134 18 2013

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
8777
ISSN(印刷物)0277-786X
ISSN(電子版)1996-756X

その他

その他Damage to VUV, EUV, and X-Ray Optics IV; and EUV and X-Ray Optics: Synergy Between Laboratory and Space III
チェコ共和国
Prague
期間4/15/134/18/13

Fingerprint

Laser-produced Plasma
Laser produced plasmas
Micromachining
inorganic materials
organic materials
laser plasmas
Block Copolymers
Ablation
Radiation
Polymethyl Methacrylate
micromachining
micrometers
radiation
block copolymers
Irradiation
ablation
Block copolymers
radiant flux density
Microstructure
Molds

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

これを引用

Makimura, T., Torii, S., Nakamura, D., Takahashi, A., Okada, T., Niino, H., & Murakami, K. (2013). Responses of organic and inorganic materials to intense EUV radiation from laser-produced plasmas. : Damage to VUV, EUV, and X-Ray Optics IV; and EUV and X-Ray Optics: Synergy Between Laboratory and Space III [877706] (Proceedings of SPIE - The International Society for Optical Engineering; 巻数 8777). https://doi.org/10.1117/12.2019048

Responses of organic and inorganic materials to intense EUV radiation from laser-produced plasmas. / Makimura, Tetsuya; Torii, Shuichi; Nakamura, Daisuke; Takahashi, Akihiko; Okada, Tatsuo; Niino, Hiroyuki; Murakami, Kouichi.

Damage to VUV, EUV, and X-Ray Optics IV; and EUV and X-Ray Optics: Synergy Between Laboratory and Space III. 2013. 877706 (Proceedings of SPIE - The International Society for Optical Engineering; 巻 8777).

研究成果: 著書/レポートタイプへの貢献会議での発言

Makimura, T, Torii, S, Nakamura, D, Takahashi, A, Okada, T, Niino, H & Murakami, K 2013, Responses of organic and inorganic materials to intense EUV radiation from laser-produced plasmas. : Damage to VUV, EUV, and X-Ray Optics IV; and EUV and X-Ray Optics: Synergy Between Laboratory and Space III., 877706, Proceedings of SPIE - The International Society for Optical Engineering, 巻. 8777, Damage to VUV, EUV, and X-Ray Optics IV; and EUV and X-Ray Optics: Synergy Between Laboratory and Space III, Prague, チェコ共和国, 4/15/13. https://doi.org/10.1117/12.2019048
Makimura T, Torii S, Nakamura D, Takahashi A, Okada T, Niino H その他. Responses of organic and inorganic materials to intense EUV radiation from laser-produced plasmas. : Damage to VUV, EUV, and X-Ray Optics IV; and EUV and X-Ray Optics: Synergy Between Laboratory and Space III. 2013. 877706. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.2019048
Makimura, Tetsuya ; Torii, Shuichi ; Nakamura, Daisuke ; Takahashi, Akihiko ; Okada, Tatsuo ; Niino, Hiroyuki ; Murakami, Kouichi. / Responses of organic and inorganic materials to intense EUV radiation from laser-produced plasmas. Damage to VUV, EUV, and X-Ray Optics IV; and EUV and X-Ray Optics: Synergy Between Laboratory and Space III. 2013. (Proceedings of SPIE - The International Society for Optical Engineering).
@inproceedings{95802f6fcf634e38a8bc3dbf95b888e8,
title = "Responses of organic and inorganic materials to intense EUV radiation from laser-produced plasmas",
abstract = "We have investigated responses of polymers to EUV radiation from laser-produced plasmas beyond ablation thresholds and micromachining. We concentrated on fabricate precise 3D micro-structures of PDMS, PMMA, acrylic block copolymers (BCP), and silica. The micromachining technique can be applied to three-dimensional micro-fluidic and bio-medical devices. The EUV processing is a promising to realize a practical micromachining technique. In the present work, we used two EUV radiation sources; (a) Wide band EUV light in a range of 10{300 eV was generated by irradiation of Ta targets with Nd:YAG laser light at 500 mJ/pulse. (b) Narrow band EUV light at 11 and 13 nm was generated by irradiation of solid Xe and Sn targets, respectively, with pulsed TEA CO2 laser light. The generated EUV light was condensed onto the materials at high power density beyond the ablation thresholds, using ellipsoidal mirrors. We found that through-holes with a diameter of one micrometer can be fabricated in PMMA and PDMS sheets with thicknesses of 4-10 micrometers, at 250 and 230 nm/shot, respectively. The effective ablation of PMMA sheets can be applied to a LIGA-like process for fabricating micro-structures of metals for micro- and nano-molds. PDMS sheets are ablated if it is irradiated with EUV light beyond a distinct threshold power density, while PDMS surfaces were modified at lower power densities. Furthermore, BCP sheets were ablated to have 1-micrometer structures. Thus, we have developed a practical technique for micromachining of PMMA, PDMS and BCP sheets in a micrometer scale.",
author = "Tetsuya Makimura and Shuichi Torii and Daisuke Nakamura and Akihiko Takahashi and Tatsuo Okada and Hiroyuki Niino and Kouichi Murakami",
year = "2013",
month = "8",
day = "1",
doi = "10.1117/12.2019048",
language = "English",
isbn = "9780819495792",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Damage to VUV, EUV, and X-Ray Optics IV; and EUV and X-Ray Optics",

}

TY - GEN

T1 - Responses of organic and inorganic materials to intense EUV radiation from laser-produced plasmas

AU - Makimura, Tetsuya

AU - Torii, Shuichi

AU - Nakamura, Daisuke

AU - Takahashi, Akihiko

AU - Okada, Tatsuo

AU - Niino, Hiroyuki

AU - Murakami, Kouichi

PY - 2013/8/1

Y1 - 2013/8/1

N2 - We have investigated responses of polymers to EUV radiation from laser-produced plasmas beyond ablation thresholds and micromachining. We concentrated on fabricate precise 3D micro-structures of PDMS, PMMA, acrylic block copolymers (BCP), and silica. The micromachining technique can be applied to three-dimensional micro-fluidic and bio-medical devices. The EUV processing is a promising to realize a practical micromachining technique. In the present work, we used two EUV radiation sources; (a) Wide band EUV light in a range of 10{300 eV was generated by irradiation of Ta targets with Nd:YAG laser light at 500 mJ/pulse. (b) Narrow band EUV light at 11 and 13 nm was generated by irradiation of solid Xe and Sn targets, respectively, with pulsed TEA CO2 laser light. The generated EUV light was condensed onto the materials at high power density beyond the ablation thresholds, using ellipsoidal mirrors. We found that through-holes with a diameter of one micrometer can be fabricated in PMMA and PDMS sheets with thicknesses of 4-10 micrometers, at 250 and 230 nm/shot, respectively. The effective ablation of PMMA sheets can be applied to a LIGA-like process for fabricating micro-structures of metals for micro- and nano-molds. PDMS sheets are ablated if it is irradiated with EUV light beyond a distinct threshold power density, while PDMS surfaces were modified at lower power densities. Furthermore, BCP sheets were ablated to have 1-micrometer structures. Thus, we have developed a practical technique for micromachining of PMMA, PDMS and BCP sheets in a micrometer scale.

AB - We have investigated responses of polymers to EUV radiation from laser-produced plasmas beyond ablation thresholds and micromachining. We concentrated on fabricate precise 3D micro-structures of PDMS, PMMA, acrylic block copolymers (BCP), and silica. The micromachining technique can be applied to three-dimensional micro-fluidic and bio-medical devices. The EUV processing is a promising to realize a practical micromachining technique. In the present work, we used two EUV radiation sources; (a) Wide band EUV light in a range of 10{300 eV was generated by irradiation of Ta targets with Nd:YAG laser light at 500 mJ/pulse. (b) Narrow band EUV light at 11 and 13 nm was generated by irradiation of solid Xe and Sn targets, respectively, with pulsed TEA CO2 laser light. The generated EUV light was condensed onto the materials at high power density beyond the ablation thresholds, using ellipsoidal mirrors. We found that through-holes with a diameter of one micrometer can be fabricated in PMMA and PDMS sheets with thicknesses of 4-10 micrometers, at 250 and 230 nm/shot, respectively. The effective ablation of PMMA sheets can be applied to a LIGA-like process for fabricating micro-structures of metals for micro- and nano-molds. PDMS sheets are ablated if it is irradiated with EUV light beyond a distinct threshold power density, while PDMS surfaces were modified at lower power densities. Furthermore, BCP sheets were ablated to have 1-micrometer structures. Thus, we have developed a practical technique for micromachining of PMMA, PDMS and BCP sheets in a micrometer scale.

UR - http://www.scopus.com/inward/record.url?scp=84880743478&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84880743478&partnerID=8YFLogxK

U2 - 10.1117/12.2019048

DO - 10.1117/12.2019048

M3 - Conference contribution

AN - SCOPUS:84880743478

SN - 9780819495792

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Damage to VUV, EUV, and X-Ray Optics IV; and EUV and X-Ray Optics

ER -