Responses of polymers to laser plasma EUV light beyond ablation threshold and micromachining

Tetsuya Makimura, Shuichi Torii, Kota Okazaki, Daisuke Nakamura, Akihiko Takahashi, Hiroyuki Niino, Tatsuo Okada, Kouichi Murakami

研究成果: 著書/レポートタイプへの貢献会議での発言

1 引用 (Scopus)

抄録

We have investigated responses of PDMS, PMMA and acrylic block copolymers (BCP) to EUV light from laserproduced plasma beyond ablation thresholds and micromachining. We generated wide band EUV light around 100 eV by irradiation of Ta targets with Nd:YAG laser light. In addition, narrow band EUV light at 11 and 13 nm were generated by irradiation of solid Xe and Sn targets, respectively, with pulsed CO2 laser light. The generated EUV light was condensed onto samples, using an ellipsoidal mirror. The EUV light was incident through windows of contact masks on the samples. We found that through-holes with a diameter of 1 μm can be fabricated in PDMS sheets with thicknesses of 10 μm. PDMS sheets are ablated if they are irradiated with EUV light beyond a threshold power density, while PDMS surfaces were modified by irradiation with the narrow band EUV light at lower power densities. Effective ablation of PMMA sheets can be applied to a LIGA-like process for fabricating micro-structures of metals using the practical apparatus. Furthermore, BCP sheets were ablated to have micro-structures. Thus, we have developed a practical technique for microma chining of PMMA, PDMS and BCP sheets in a micrometer scale.

元の言語英語
ホスト出版物のタイトルDamage to VUV, EUV, and X-Ray Optics III
DOI
出版物ステータス出版済み - 7 25 2011
イベントDamage to VUV, EUV, and X-Ray Optics III - Prague, チェコ共和国
継続期間: 4 18 20114 20 2011

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
8077
ISSN(印刷物)0277-786X

その他

その他Damage to VUV, EUV, and X-Ray Optics III
チェコ共和国
Prague
期間4/18/114/20/11

Fingerprint

Laser Plasma
Block Copolymers
Micromachining
Ablation
micromachining
laser plasmas
Irradiation
ablation
Polymers
Plasmas
thresholds
Lasers
Microstructure
polymers
CO2 Laser
Target
Nd:YAG Laser
Pulsed Laser
Polymethyl Methacrylate
block copolymers

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

これを引用

Makimura, T., Torii, S., Okazaki, K., Nakamura, D., Takahashi, A., Niino, H., ... Murakami, K. (2011). Responses of polymers to laser plasma EUV light beyond ablation threshold and micromachining. : Damage to VUV, EUV, and X-Ray Optics III [80770F] (Proceedings of SPIE - The International Society for Optical Engineering; 巻数 8077). https://doi.org/10.1117/12.887615

Responses of polymers to laser plasma EUV light beyond ablation threshold and micromachining. / Makimura, Tetsuya; Torii, Shuichi; Okazaki, Kota; Nakamura, Daisuke; Takahashi, Akihiko; Niino, Hiroyuki; Okada, Tatsuo; Murakami, Kouichi.

Damage to VUV, EUV, and X-Ray Optics III. 2011. 80770F (Proceedings of SPIE - The International Society for Optical Engineering; 巻 8077).

研究成果: 著書/レポートタイプへの貢献会議での発言

Makimura, T, Torii, S, Okazaki, K, Nakamura, D, Takahashi, A, Niino, H, Okada, T & Murakami, K 2011, Responses of polymers to laser plasma EUV light beyond ablation threshold and micromachining. : Damage to VUV, EUV, and X-Ray Optics III., 80770F, Proceedings of SPIE - The International Society for Optical Engineering, 巻. 8077, Damage to VUV, EUV, and X-Ray Optics III, Prague, チェコ共和国, 4/18/11. https://doi.org/10.1117/12.887615
Makimura T, Torii S, Okazaki K, Nakamura D, Takahashi A, Niino H その他. Responses of polymers to laser plasma EUV light beyond ablation threshold and micromachining. : Damage to VUV, EUV, and X-Ray Optics III. 2011. 80770F. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.887615
Makimura, Tetsuya ; Torii, Shuichi ; Okazaki, Kota ; Nakamura, Daisuke ; Takahashi, Akihiko ; Niino, Hiroyuki ; Okada, Tatsuo ; Murakami, Kouichi. / Responses of polymers to laser plasma EUV light beyond ablation threshold and micromachining. Damage to VUV, EUV, and X-Ray Optics III. 2011. (Proceedings of SPIE - The International Society for Optical Engineering).
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