Simulation of spatial characteristics of very high frequency hydrogen plasma produced by a balanced power feeding

Kohei Ogiwara, Weiting Chen, Kiichiro Uchino, Yoshinobu Kawai

研究成果: Contribution to journalArticle査読

7 被引用数 (Scopus)

抄録

The effects of a balanced power feeding (BPF) method on a very high frequency hydrogen plasma produced with narrow-gap parallel plate electrodes are studied by 2-dimensional simulation. It was found that the electron density increases inside the electrodes and decreases outside the electrodes. The input power was effectively absorbed into the intermediate region of the electrodes. In addition, the electron density outside the electrodes decreased with increasing the gas pressure, and the electron density inside the electrodes peaked at a certain pressure. The property of the power absorption was improved and the electron temperature decreased for the higher gas pressure in the BPF model.

本文言語英語
ページ(範囲)132-136
ページ数5
ジャーナルThin Solid Films
547
DOI
出版ステータス出版済み - 11 29 2013

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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