Spectral dynamics analysis of ultra-line-narrowed F2 laser

Takahito Kumazaki, Osamu Wakabayashi, Ryoichi Nohdomi, Tatsuya Ariga, Hidenori Watanabe, Kazuaki Hotta, Hakaru Mizoguchi, Hiroki Tanaka, Akihiko Takahashi, Tatsuo Okada

研究成果: ジャーナルへの寄稿Conference article

抄録

We have developed an ultra-line-narrowed, high-repetition-rate, high-power injection-locked F2 laser system for 157 nm dioptric projection systems under the ASET project "F2 Laser Lithography Development Project". A spectral bandwidth of <0.2 pm (FWHM), an output power of >25 W, and an energy stability (3-sigma) of <10 % at 5 kHz repetition rate was successfully obtained by using a low-power ultra-line-narrowed oscillator laser and a high-gain multi-pass amplifier laser. These parameters satisfy the requirements of exposure tools. A numerical simulation code that can simulate the spectral dynamics of the F2 laser under different operation modes such as free running operation, line-narrowed operation, and injection-locked operation, has also been developed. Using this simulation code, it is found that the instantaneous spectral bandwidth narrows monotonously during the laser pulse, and a narrower spectral output can be obtained by seeding the tail area of the line-narrowed F2laser pulse. And the line-narrowing operation of the oscillator laser and the behavior of the injection-locked laser system can be predicted very precisely with this simulation code. The development of F2 laser for microlithography will be accelerated by this new simulation code.

元の言語英語
ページ(範囲)1363-1370
ページ数8
ジャーナルProceedings of SPIE - The International Society for Optical Engineering
5040 III
DOI
出版物ステータス出版済み - 10 1 2003
イベントOptical Microlithography XVI - Santa Clara, CA, 米国
継続期間: 2 25 20032 28 2003

Fingerprint

Spectral Analysis
Dynamic Analysis
Dynamic analysis
Laser
Lasers
Line
lasers
Injection
Lithography
injection
Bandwidth
repetition
Projection systems
simulation
Light amplifiers
oscillators
Microlithography
bandwidth
Laser modes
Simulation

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

これを引用

Kumazaki, T., Wakabayashi, O., Nohdomi, R., Ariga, T., Watanabe, H., Hotta, K., ... Okada, T. (2003). Spectral dynamics analysis of ultra-line-narrowed F2 laser. Proceedings of SPIE - The International Society for Optical Engineering, 5040 III, 1363-1370. https://doi.org/10.1117/12.485381

Spectral dynamics analysis of ultra-line-narrowed F2 laser. / Kumazaki, Takahito; Wakabayashi, Osamu; Nohdomi, Ryoichi; Ariga, Tatsuya; Watanabe, Hidenori; Hotta, Kazuaki; Mizoguchi, Hakaru; Tanaka, Hiroki; Takahashi, Akihiko; Okada, Tatsuo.

:: Proceedings of SPIE - The International Society for Optical Engineering, 巻 5040 III, 01.10.2003, p. 1363-1370.

研究成果: ジャーナルへの寄稿Conference article

Kumazaki, T, Wakabayashi, O, Nohdomi, R, Ariga, T, Watanabe, H, Hotta, K, Mizoguchi, H, Tanaka, H, Takahashi, A & Okada, T 2003, 'Spectral dynamics analysis of ultra-line-narrowed F2 laser', Proceedings of SPIE - The International Society for Optical Engineering, 巻. 5040 III, pp. 1363-1370. https://doi.org/10.1117/12.485381
Kumazaki T, Wakabayashi O, Nohdomi R, Ariga T, Watanabe H, Hotta K その他. Spectral dynamics analysis of ultra-line-narrowed F2 laser. Proceedings of SPIE - The International Society for Optical Engineering. 2003 10 1;5040 III:1363-1370. https://doi.org/10.1117/12.485381
Kumazaki, Takahito ; Wakabayashi, Osamu ; Nohdomi, Ryoichi ; Ariga, Tatsuya ; Watanabe, Hidenori ; Hotta, Kazuaki ; Mizoguchi, Hakaru ; Tanaka, Hiroki ; Takahashi, Akihiko ; Okada, Tatsuo. / Spectral dynamics analysis of ultra-line-narrowed F2 laser. :: Proceedings of SPIE - The International Society for Optical Engineering. 2003 ; 巻 5040 III. pp. 1363-1370.
@article{ac3e63320eaf417c8b35f740912ab6fd,
title = "Spectral dynamics analysis of ultra-line-narrowed F2 laser",
abstract = "We have developed an ultra-line-narrowed, high-repetition-rate, high-power injection-locked F2 laser system for 157 nm dioptric projection systems under the ASET project {"}F2 Laser Lithography Development Project{"}. A spectral bandwidth of <0.2 pm (FWHM), an output power of >25 W, and an energy stability (3-sigma) of <10 {\%} at 5 kHz repetition rate was successfully obtained by using a low-power ultra-line-narrowed oscillator laser and a high-gain multi-pass amplifier laser. These parameters satisfy the requirements of exposure tools. A numerical simulation code that can simulate the spectral dynamics of the F2 laser under different operation modes such as free running operation, line-narrowed operation, and injection-locked operation, has also been developed. Using this simulation code, it is found that the instantaneous spectral bandwidth narrows monotonously during the laser pulse, and a narrower spectral output can be obtained by seeding the tail area of the line-narrowed F2laser pulse. And the line-narrowing operation of the oscillator laser and the behavior of the injection-locked laser system can be predicted very precisely with this simulation code. The development of F2 laser for microlithography will be accelerated by this new simulation code.",
author = "Takahito Kumazaki and Osamu Wakabayashi and Ryoichi Nohdomi and Tatsuya Ariga and Hidenori Watanabe and Kazuaki Hotta and Hakaru Mizoguchi and Hiroki Tanaka and Akihiko Takahashi and Tatsuo Okada",
year = "2003",
month = "10",
day = "1",
doi = "10.1117/12.485381",
language = "English",
volume = "5040 III",
pages = "1363--1370",
journal = "Proceedings of SPIE - The International Society for Optical Engineering",
issn = "0277-786X",
publisher = "SPIE",

}

TY - JOUR

T1 - Spectral dynamics analysis of ultra-line-narrowed F2 laser

AU - Kumazaki, Takahito

AU - Wakabayashi, Osamu

AU - Nohdomi, Ryoichi

AU - Ariga, Tatsuya

AU - Watanabe, Hidenori

AU - Hotta, Kazuaki

AU - Mizoguchi, Hakaru

AU - Tanaka, Hiroki

AU - Takahashi, Akihiko

AU - Okada, Tatsuo

PY - 2003/10/1

Y1 - 2003/10/1

N2 - We have developed an ultra-line-narrowed, high-repetition-rate, high-power injection-locked F2 laser system for 157 nm dioptric projection systems under the ASET project "F2 Laser Lithography Development Project". A spectral bandwidth of <0.2 pm (FWHM), an output power of >25 W, and an energy stability (3-sigma) of <10 % at 5 kHz repetition rate was successfully obtained by using a low-power ultra-line-narrowed oscillator laser and a high-gain multi-pass amplifier laser. These parameters satisfy the requirements of exposure tools. A numerical simulation code that can simulate the spectral dynamics of the F2 laser under different operation modes such as free running operation, line-narrowed operation, and injection-locked operation, has also been developed. Using this simulation code, it is found that the instantaneous spectral bandwidth narrows monotonously during the laser pulse, and a narrower spectral output can be obtained by seeding the tail area of the line-narrowed F2laser pulse. And the line-narrowing operation of the oscillator laser and the behavior of the injection-locked laser system can be predicted very precisely with this simulation code. The development of F2 laser for microlithography will be accelerated by this new simulation code.

AB - We have developed an ultra-line-narrowed, high-repetition-rate, high-power injection-locked F2 laser system for 157 nm dioptric projection systems under the ASET project "F2 Laser Lithography Development Project". A spectral bandwidth of <0.2 pm (FWHM), an output power of >25 W, and an energy stability (3-sigma) of <10 % at 5 kHz repetition rate was successfully obtained by using a low-power ultra-line-narrowed oscillator laser and a high-gain multi-pass amplifier laser. These parameters satisfy the requirements of exposure tools. A numerical simulation code that can simulate the spectral dynamics of the F2 laser under different operation modes such as free running operation, line-narrowed operation, and injection-locked operation, has also been developed. Using this simulation code, it is found that the instantaneous spectral bandwidth narrows monotonously during the laser pulse, and a narrower spectral output can be obtained by seeding the tail area of the line-narrowed F2laser pulse. And the line-narrowing operation of the oscillator laser and the behavior of the injection-locked laser system can be predicted very precisely with this simulation code. The development of F2 laser for microlithography will be accelerated by this new simulation code.

UR - http://www.scopus.com/inward/record.url?scp=0141610081&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0141610081&partnerID=8YFLogxK

U2 - 10.1117/12.485381

DO - 10.1117/12.485381

M3 - Conference article

AN - SCOPUS:0141610081

VL - 5040 III

SP - 1363

EP - 1370

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

SN - 0277-786X

ER -