Sputtering Growth of Metal Oxynitride Semiconductors for Excitonic Devices

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

抄録

Effects of substrate surface polarity on the growth of sputter-deposited (\text{ZnO})_{x}}(\text{InN})_{1-x} (called 'ZION' hereinafter) films have been investigated. ZION films were deposited on Zn-face and O-face ZnO substrates by radio-frequency magnetron sputtering. The ZION film on the Zn-face substrate has rough surface with the root mean square (RMS) roughness of 4.30 nm, whereas, the ZION film on O-face ZnO substrate has smooth surface with the RMS roughness of 2.71 nm. This result is attributed to the difference in Zn mobility on the substrate surfaces.

本文言語英語
ホスト出版物のタイトル2021 5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021
出版社Institute of Electrical and Electronics Engineers Inc.
ISBN(電子版)9781728181769
DOI
出版ステータス出版済み - 4 8 2021
イベント5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021 - Chengdu, 中国
継続期間: 4 8 20214 11 2021

出版物シリーズ

名前2021 5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021

会議

会議5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021
国/地域中国
CityChengdu
Period4/8/214/11/21

All Science Journal Classification (ASJC) codes

  • 電子工学および電気工学
  • 産業および生産工学
  • 電子材料、光学材料、および磁性材料

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