Stabilization of polystyrene thin films against dewetting by silsesquioxane-terminated polystyrene additives

Kyota Miyamoto, Nao Hosaka, Hideyuki Otsuka, Atsushi Takahara

研究成果: Contribution to journalArticle査読

12 被引用数 (Scopus)

抄録

A polyhedral oligomeric silsesquioxane (POSS)-containing initiator for nitroxide-mediated radical polymerization was synthesized to prepare organic-inorganic hybrid polymers (PS-POSS), which are polystyrene (PS) with a POSS end group. PS-POSS were well dispersed in PS thin films and provided thermal stability to films against dewetting.

本文言語英語
ページ(範囲)1098-1099
ページ数2
ジャーナルChemistry Letters
35
10
DOI
出版ステータス出版済み - 10 5 2006

All Science Journal Classification (ASJC) codes

  • 化学 (全般)

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