Stabilization of polystyrene thin films by introduction of a functional end group

Shinichiro Shimomura, Manabu Inutsuka, Koichiro Tajima, Masaaki Nabika, Satoru Moritomi, Hisao Matsuno, Keiji Tanaka

    研究成果: Contribution to journalArticle査読

    14 被引用数 (Scopus)

    抄録

    The thin film stabilities of ω-N-(3-(dimethylamino)propyl)propylamide-terminated polystyrene (PS-N) and its blends with conventional polystyrene (PS-H) supported on silicon wafers with a native oxide layer were examined. Whereas a 20-nm-thick film of PS-H with a number-average molecular weight of ∼50k decomposed at 423 K, a comparable PS-N film and blended films containing a PS-N fraction of >40 wt% were stable. Although the local conformation of chains at the substrate interface was not the same for PS with and without the functional end group, the glass transition temperature at the interface was identical for both PS-H and PS-N. The residual adsorbed layer on the substrate after washing the films with a good solvent was thicker for PS-N than for PS-H. This implies that end functionalization, rather than segmental dynamics, affects chain movement on a large scale.

    本文言語英語
    ページ(範囲)949-953
    ページ数5
    ジャーナルPolymer Journal
    48
    9
    DOI
    出版ステータス出版済み - 9 1 2016

    All Science Journal Classification (ASJC) codes

    • ポリマーおよびプラスチック
    • 材料化学

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