Stabilization of polystyrene thin films by introduction of a functional end group

Shinichiro Shimomura, Manabu Inutsuka, Koichiro Tajima, Masaaki Nabika, Satoru Moritomi, Hisao Matsuno, Keiji Tanaka

研究成果: ジャーナルへの寄稿記事

12 引用 (Scopus)

抄録

The thin film stabilities of ω-N-(3-(dimethylamino)propyl)propylamide-terminated polystyrene (PS-N) and its blends with conventional polystyrene (PS-H) supported on silicon wafers with a native oxide layer were examined. Whereas a 20-nm-thick film of PS-H with a number-average molecular weight of ∼50k decomposed at 423 K, a comparable PS-N film and blended films containing a PS-N fraction of >40 wt% were stable. Although the local conformation of chains at the substrate interface was not the same for PS with and without the functional end group, the glass transition temperature at the interface was identical for both PS-H and PS-N. The residual adsorbed layer on the substrate after washing the films with a good solvent was thicker for PS-N than for PS-H. This implies that end functionalization, rather than segmental dynamics, affects chain movement on a large scale.

元の言語英語
ページ(範囲)949-953
ページ数5
ジャーナルPolymer Journal
48
発行部数9
DOI
出版物ステータス出版済み - 9 1 2016

Fingerprint

Polystyrenes
Stabilization
Thin films
Substrates
Silicon wafers
Thick films
Washing
Oxides
Conformations
Molecular weight

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Materials Chemistry

これを引用

Stabilization of polystyrene thin films by introduction of a functional end group. / Shimomura, Shinichiro; Inutsuka, Manabu; Tajima, Koichiro; Nabika, Masaaki; Moritomi, Satoru; Matsuno, Hisao; Tanaka, Keiji.

:: Polymer Journal, 巻 48, 番号 9, 01.09.2016, p. 949-953.

研究成果: ジャーナルへの寄稿記事

Shimomura, S, Inutsuka, M, Tajima, K, Nabika, M, Moritomi, S, Matsuno, H & Tanaka, K 2016, 'Stabilization of polystyrene thin films by introduction of a functional end group', Polymer Journal, 巻. 48, 番号 9, pp. 949-953. https://doi.org/10.1038/pj.2016.58
Shimomura S, Inutsuka M, Tajima K, Nabika M, Moritomi S, Matsuno H その他. Stabilization of polystyrene thin films by introduction of a functional end group. Polymer Journal. 2016 9 1;48(9):949-953. https://doi.org/10.1038/pj.2016.58
Shimomura, Shinichiro ; Inutsuka, Manabu ; Tajima, Koichiro ; Nabika, Masaaki ; Moritomi, Satoru ; Matsuno, Hisao ; Tanaka, Keiji. / Stabilization of polystyrene thin films by introduction of a functional end group. :: Polymer Journal. 2016 ; 巻 48, 番号 9. pp. 949-953.
@article{b07e4f83f5b644d8bac40ddbde04ea84,
title = "Stabilization of polystyrene thin films by introduction of a functional end group",
abstract = "The thin film stabilities of ω-N-(3-(dimethylamino)propyl)propylamide-terminated polystyrene (PS-N) and its blends with conventional polystyrene (PS-H) supported on silicon wafers with a native oxide layer were examined. Whereas a 20-nm-thick film of PS-H with a number-average molecular weight of ∼50k decomposed at 423 K, a comparable PS-N film and blended films containing a PS-N fraction of >40 wt{\%} were stable. Although the local conformation of chains at the substrate interface was not the same for PS with and without the functional end group, the glass transition temperature at the interface was identical for both PS-H and PS-N. The residual adsorbed layer on the substrate after washing the films with a good solvent was thicker for PS-N than for PS-H. This implies that end functionalization, rather than segmental dynamics, affects chain movement on a large scale.",
author = "Shinichiro Shimomura and Manabu Inutsuka and Koichiro Tajima and Masaaki Nabika and Satoru Moritomi and Hisao Matsuno and Keiji Tanaka",
year = "2016",
month = "9",
day = "1",
doi = "10.1038/pj.2016.58",
language = "English",
volume = "48",
pages = "949--953",
journal = "Polymer Journal",
issn = "0032-3896",
publisher = "Nature Publishing Group",
number = "9",

}

TY - JOUR

T1 - Stabilization of polystyrene thin films by introduction of a functional end group

AU - Shimomura, Shinichiro

AU - Inutsuka, Manabu

AU - Tajima, Koichiro

AU - Nabika, Masaaki

AU - Moritomi, Satoru

AU - Matsuno, Hisao

AU - Tanaka, Keiji

PY - 2016/9/1

Y1 - 2016/9/1

N2 - The thin film stabilities of ω-N-(3-(dimethylamino)propyl)propylamide-terminated polystyrene (PS-N) and its blends with conventional polystyrene (PS-H) supported on silicon wafers with a native oxide layer were examined. Whereas a 20-nm-thick film of PS-H with a number-average molecular weight of ∼50k decomposed at 423 K, a comparable PS-N film and blended films containing a PS-N fraction of >40 wt% were stable. Although the local conformation of chains at the substrate interface was not the same for PS with and without the functional end group, the glass transition temperature at the interface was identical for both PS-H and PS-N. The residual adsorbed layer on the substrate after washing the films with a good solvent was thicker for PS-N than for PS-H. This implies that end functionalization, rather than segmental dynamics, affects chain movement on a large scale.

AB - The thin film stabilities of ω-N-(3-(dimethylamino)propyl)propylamide-terminated polystyrene (PS-N) and its blends with conventional polystyrene (PS-H) supported on silicon wafers with a native oxide layer were examined. Whereas a 20-nm-thick film of PS-H with a number-average molecular weight of ∼50k decomposed at 423 K, a comparable PS-N film and blended films containing a PS-N fraction of >40 wt% were stable. Although the local conformation of chains at the substrate interface was not the same for PS with and without the functional end group, the glass transition temperature at the interface was identical for both PS-H and PS-N. The residual adsorbed layer on the substrate after washing the films with a good solvent was thicker for PS-N than for PS-H. This implies that end functionalization, rather than segmental dynamics, affects chain movement on a large scale.

UR - http://www.scopus.com/inward/record.url?scp=84985995190&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84985995190&partnerID=8YFLogxK

U2 - 10.1038/pj.2016.58

DO - 10.1038/pj.2016.58

M3 - Article

AN - SCOPUS:84985995190

VL - 48

SP - 949

EP - 953

JO - Polymer Journal

JF - Polymer Journal

SN - 0032-3896

IS - 9

ER -