Structural and compositional characterization of N 2 -H 2 plasma surface-treated TiO 2 thin films

L. Miao, S. Tanemura, H. Watanabe, S. Toh, K. Kaneko

    研究成果: Contribution to journalConference article査読

    12 被引用数 (Scopus)

    抄録

    The structural and compositional properties of three samples such as as-deposited single-phase anatase-TiO 2 polycrystalline thin films on slide glass substrates (No. 1), the sample surface-treated by N 2 -H 2 mixed-gases plasma (No. 2), and the sample being additionally anneal-treated in N 2 gases (No. 3), are characterized by transmission electron microscopy (TEM) and energy dispersive X-ray spectroscopy (EDS). The primitive lattice cells of three thin films are verified as distorted in comparison with that of bulk from the TEM results. This distortion of primitive lattice cell causes the increase of optical band gap for the films when we compared it with that of bulk, while the decrease of optical band gap should be attributed to the substitution of N into TiO 2 . Higher concentration of nitrogen in sample No. 3 is confirmed by line-EDS profiles under scanning TEM (STEM) when compared with sample No. 2 and this confirms that plasma surface treatment is an effective way for N-doping in TiO 2 .

    本文言語英語
    ページ(範囲)412-417
    ページ数6
    ジャーナルApplied Surface Science
    244
    1-4
    DOI
    出版ステータス出版済み - 5 15 2005
    イベント12th International Conference on Solid Films and Surfaces - Hammatsu, 日本
    継続期間: 6 21 20046 25 2004

    All Science Journal Classification (ASJC) codes

    • 化学 (全般)
    • 凝縮系物理学
    • 物理学および天文学(全般)
    • 表面および界面
    • 表面、皮膜および薄膜

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