抄録
The (2 × 1) structure of the two-dimensional nickel silicide surface alloy on Ni(111) was investigated using quantitative low-energy electron diffraction analysis. The unit cell of the determined silicide structure contains one Si and one Ni atom, corresponding to a chemical formula of NiSi. The Si atoms adopt substitutional face-centered cubic hollow sites on the Ni(111) substrate. The Ni-Si bond lengths were determined to be 2.37 and 2.34 Å. Both the alloy surface and the underlying first layers of Ni atoms exhibit slight corrugation. The Ni-Si interlayer distance is smaller than the Ni-Ni interlayer distance, which indicates that Si atoms and underlying Ni atoms strongly interact.
本文言語 | 英語 |
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論文番号 | 125701 |
ジャーナル | Japanese journal of applied physics |
巻 | 54 |
号 | 12 |
DOI | |
出版ステータス | 出版済み - 12月 2015 |
!!!All Science Journal Classification (ASJC) codes
- 工学(全般)
- 物理学および天文学(全般)