Study of growth kinetics and behaviour of particles in a heliumsilane rf plasma using laser diagnostic methods

Yukio Watanabe, Masaharu Shiratani, Masayuki Yamashita

研究成果: ジャーナルへの寄稿記事

31 引用 (Scopus)

抜粋

Growth kinetics and behaviours of particles in a He-SiH plasma are observed using the rf modulation method together with two in situ laser diagnostic methods. Observation reveals that particles tend to be sustained around the plasma/sheath boundary near the rf electrode, their size and density being 60-180 nm and 103-103 cm-3, and larger particles exist in a higher electric field region near the rf electrode. The particle growth rate is explained by taking into account the contribution of radical ion and/or radical fluxes. The particle trapping around the sheath edge is explained by balance between the electrostatic force and the ion drag force. An effect of the viscous force on the. particles and a suppression mechanism for RF-modulated discharges are also discussed.

元の言語英語
ページ(範囲)35-39
ページ数5
ジャーナルPlasma Sources Science and Technology
2
発行部数1
DOI
出版物ステータス出版済み - 1 1 1993
外部発表Yes

    フィンガープリント

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics

これを引用