Study of spatial profiles of capacitively coupled VHF H2 plasma by simulation

Kuan Chen Chen, Kuo Feng Chiu, Kohei Ogiwara, Li Wen Su, Kiichiro Uchino, Yoshinobu Kawai

研究成果: ジャーナルへの寄稿学術誌査読

1 被引用数 (Scopus)

抄録

The spatial profiles of a VHF H2 plasma (60MHz) for different discharge gap distances were examined at pressures of 66.7 and 133.3 Pa by twodimensional simulations using the plasma hybrid code. The electron density had a peak profile, and the maximum density depended on both the discharge gap distance and the pressure. A high-electron-density plasma with a low-electron temperature of approximately 1 eV was predicted by simulation at discharge gap distances of 15 and 20 mm. The plasma potential profile was composed of a plateau at the center and sharp slopes at the two sides. The axial profiles of the H+, H2+, and H3+ densities were calculated for the discharge gap distances of 10, 15, and 20 mm. It was found that the dominant ion species was H3+ except near the discharge electrode and the H2+ density near the discharge electrode was not negligible compared with the H3+ density at 66.7 Pa.

本文言語英語
論文番号01AC05
ジャーナルJapanese journal of applied physics
56
1
DOI
出版ステータス出版済み - 1月 2017

!!!All Science Journal Classification (ASJC) codes

  • 工学(全般)
  • 物理学および天文学(全般)

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