Study of the effect of a probe on the plasma in the source region of an electron cyclotron resonance discharge

M. D. Bowden, F. Kimura, H. Muta, K. Uchino, K. Muraoka

研究成果: Contribution to journalArticle査読

6 被引用数 (Scopus)

抄録

Langmuir probes are commonly used to measure electron density and temperature in the low temperature and low density plasmas used in plasma processing, although the plasma conditions are sometimes not ideal for such measurements. We report measurements of the perturbing effect of such probes in the high magnetic field region of an electron cyclotron resonance discharge by making Thomson scattering measurements of electron temperature and density under normal operating conditions and also in the presence of a probe. The results revealed that the probe clearly qualitatively changed the plasma. An attempt to quantify this change appeared to indicate that the effect of the probe was to decrease the electron density and increase the electron temperature in the vicinity of the probe.

本文言語英語
ページ(範囲)2893-2896
ページ数4
ジャーナルJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
11
6
DOI
出版ステータス出版済み - 11 1993

All Science Journal Classification (ASJC) codes

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜

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