Suppression of by-product generation in the treatment of aromatic perfumery substances using a surface discharge

Nobuya Hayashi, Shohei Sougumo

研究成果: Contribution to journalArticle査読

抄録

Treatment of perfumery materials such as aromatic hydrocarbons was attempted using atmospheric surface discharge and UV light irradiation. The maximum decomposition rate of phenyl ethyl benzene with a concentration of 8% using the discharge with UV light is 96%, that is 12% higher than that without UV light. Combination of surface discharge and UV light enhances the decomposition rate and energy efficiency, and enables to suppress the generation of by-products such as benzene.

本文言語英語
ページ(範囲)138-141
ページ数4
ジャーナルVacuum
83
1
DOI
出版ステータス出版済み - 9 4 2008
外部発表はい

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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