Surface patterned graft copolymerization of hydrophilic monomers onto hydrophobic polymer film upon UV irradiation

Ryusuke Enomoto, Masanao Sato, Shota Fujii, Tomoyasu Hirai, Atsushi Takahara, Kazuhiko Ishihara, Shin Ichi Yusa

研究成果: Contribution to journalArticle査読

10 被引用数 (Scopus)

抄録

A random copolymer [p(MMA/DMAB)] composed of methyl methacrylate (MMA) and 2,2-dimethoxy-1,2-di(4-methacryloyloxy)phenylethane-1-one (DMAB), which can simultaneously act as a photoradical initiator and crosslinkable monomer, was prepared by free radical random copolymerization. A hydrophobic film on quartz glass was prepared using p(MMA/DMAB) by a spin-coating technique. Hydrophilic methacrylic acid (MA) and 2-methacryloyloxyethyl phosphorylcholine (MPC) were graft-copolymerized from the hydrophobic p(MMA/DMAB) film in water by photo-cleavage of the DMAB unit. The graft copolymer of MA and MPC was characterized by infrared and X-ray photoelectron spectroscopies and contact angle measurements. To confirm that MPC can be grafted onto the surface of the film selectively at only UV-irradiated sites, photoinduced graft copolymerization of MPC using a photomask was performed to prepare a pMPC patterned p(MMA/DMAB) film. The film was stained using a rhodamine 6G dye that can absorb specifically to pMPC to confirm the pMPC pattern. The p(MMA/DMAB) film can be applied to various fields including photolithography and biomedical applications, because the film surface properties can be controlled using various vinyl monomers selectively on UV-irradiated sites.

本文言語英語
ページ(範囲)2822-2829
ページ数8
ジャーナルJournal of Polymer Science, Part A: Polymer Chemistry
52
19
DOI
出版ステータス出版済み - 10 1 2014

All Science Journal Classification (ASJC) codes

  • ポリマーおよびプラスチック
  • 有機化学
  • 材料化学

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