Surface relaxation behavior in cyclic polystyrene films

Yoshihisa Fujii, Kazuhiro Koguchi, Keiji Tanaka, Toshihiko Nagamura, Atsushi Takano, Yushu Matsushita, Tisato Kajiyama

研究成果: 著書/レポートタイプへの貢献会議での発言

抄録

Well-defined cyclic polystyrenes (c-PS) with various molecular masses were prepared by the reaction of linear polystyrene with two end vinyl groups and potassium naphthalenide as a coupling agent. Then, surface relaxation behavior in c-PS films was examined by lateral force microscopy (LFM). The αa-relaxation process corresponding to the segmental motion was clearly observed at the surface in the c-PS films. Surface glass transition temperature so obtained was approximately 300 K, which was lower than the bulk value, and was independent of the molecular weight due to the absence of chain ends. The results indicate that the molecular motion at the polystyrene surface is activated by not only chain ends but also other factors.

元の言語英語
ホスト出版物のタイトル54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan
ページ928
ページ数1
54
エディション1
出版物ステータス出版済み - 2005
イベント54th SPSJ Annual Meeting 2005 - Yokohama, 日本
継続期間: 5 25 20055 27 2005

その他

その他54th SPSJ Annual Meeting 2005
日本
Yokohama
期間5/25/055/27/05

Fingerprint

Surface relaxation
Polystyrenes
Coupling agents
Molecular mass
Relaxation processes
Potassium
Microscopic examination
Molecular weight

All Science Journal Classification (ASJC) codes

  • Engineering(all)

これを引用

Fujii, Y., Koguchi, K., Tanaka, K., Nagamura, T., Takano, A., Matsushita, Y., & Kajiyama, T. (2005). Surface relaxation behavior in cyclic polystyrene films. : 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan (1 版, 巻 54, pp. 928)

Surface relaxation behavior in cyclic polystyrene films. / Fujii, Yoshihisa; Koguchi, Kazuhiro; Tanaka, Keiji; Nagamura, Toshihiko; Takano, Atsushi; Matsushita, Yushu; Kajiyama, Tisato.

54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan. 巻 54 1. 編 2005. p. 928.

研究成果: 著書/レポートタイプへの貢献会議での発言

Fujii, Y, Koguchi, K, Tanaka, K, Nagamura, T, Takano, A, Matsushita, Y & Kajiyama, T 2005, Surface relaxation behavior in cyclic polystyrene films. : 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan. 1 Edn, 巻. 54, pp. 928, 54th SPSJ Annual Meeting 2005, Yokohama, 日本, 5/25/05.
Fujii Y, Koguchi K, Tanaka K, Nagamura T, Takano A, Matsushita Y その他. Surface relaxation behavior in cyclic polystyrene films. : 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan. 1 版 巻 54. 2005. p. 928
Fujii, Yoshihisa ; Koguchi, Kazuhiro ; Tanaka, Keiji ; Nagamura, Toshihiko ; Takano, Atsushi ; Matsushita, Yushu ; Kajiyama, Tisato. / Surface relaxation behavior in cyclic polystyrene films. 54th SPSJ Annual Meeting 2005 - Polymer Preprints, Japan. 巻 54 1. 版 2005. pp. 928
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