Surface relaxation processes of poly(methyl methacrylate) brushes prepared by atom transfer radical polymerization

Keiji Tanaka, Ken Kojio, Reiko Kimura, Atsushi Takahara, Tisato Kajiyama

研究成果: Contribution to journalArticle査読

21 被引用数 (Scopus)

抄録

Well-defined poly(methyl methacrylate) (PMMA) brush layers were prepared onto silicon wafers by surface-initiated atom transfer radical polymerization using 2-(4-chlorosulfonylphenyl)-ethyltrichlorosilane as an initiator. Based on molecular weight and layer thickness measurements, it was deduced that the apparent graft density was 0.6-0.8 chains nm-2 depending on the polymerization time and that the conformation of tethered chains was highly extended. Surface relaxation behavior of the PMMA brush layer and the spin-coated PMMA film was examined by lateral force microscopy. The αa- and β-relaxation processes were discernibly observed at both surfaces. Although surface molecular motion of the brush layer and the spin-coated film was markedly different from the bulk one, both were hardly distinguishable in terms of relaxation phenomena.

本文言語英語
ページ(範囲)44-49
ページ数6
ジャーナルPolymer Journal
35
1
DOI
出版ステータス出版済み - 2003

All Science Journal Classification (ASJC) codes

  • ポリマーおよびプラスチック
  • 材料化学

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