Surface relaxation processes of poly(methyl methacrylate) brushes prepared by atom transfer radical polymerization

Keiji Tanaka, Ken Kojio, Reiko Kimura, Atsushi Takahara, Tisato Kajiyama

研究成果: ジャーナルへの寄稿記事

21 引用 (Scopus)

抄録

Well-defined poly(methyl methacrylate) (PMMA) brush layers were prepared onto silicon wafers by surface-initiated atom transfer radical polymerization using 2-(4-chlorosulfonylphenyl)-ethyltrichlorosilane as an initiator. Based on molecular weight and layer thickness measurements, it was deduced that the apparent graft density was 0.6-0.8 chains nm-2 depending on the polymerization time and that the conformation of tethered chains was highly extended. Surface relaxation behavior of the PMMA brush layer and the spin-coated PMMA film was examined by lateral force microscopy. The αa- and β-relaxation processes were discernibly observed at both surfaces. Although surface molecular motion of the brush layer and the spin-coated film was markedly different from the bulk one, both were hardly distinguishable in terms of relaxation phenomena.

元の言語英語
ページ(範囲)44-49
ページ数6
ジャーナルPolymer Journal
35
発行部数1
DOI
出版物ステータス出版済み - 3 27 2003

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Surface relaxation
Atom transfer radical polymerization
Relaxation processes
Polymethyl Methacrylate
Brushes
Polymethyl methacrylates
Thickness measurement
Silicon wafers
Grafts
Conformations
Microscopic examination
Molecular weight
Polymerization

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Materials Chemistry

これを引用

Surface relaxation processes of poly(methyl methacrylate) brushes prepared by atom transfer radical polymerization. / Tanaka, Keiji; Kojio, Ken; Kimura, Reiko; Takahara, Atsushi; Kajiyama, Tisato.

:: Polymer Journal, 巻 35, 番号 1, 27.03.2003, p. 44-49.

研究成果: ジャーナルへの寄稿記事

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