Surface structure study and structure determination of (√3 × √3)R 30° phase of Si-adsorption on Ni(111) by LEED

Md Sazzadur Rahman, Mohammad Tawheed Kibria, Takeshi Nakagawa, Seigi Mizuno

    研究成果: Chapter in Book/Report/Conference proceedingConference contribution

    抄録

    The phase evolution of Si on Ni (111) was studied by LEED and AES. A new phase of Si on Ni (111) was found along with the previously reported (√3 × √3)R 30° phase. The surface structure of (√3 × √3)R 30° phase had determined, with chemical composition of Ni2Si, by using low-energy electron diffraction (LEED) analysis. The obtained nickel silicide would be helpful for understanding the formation of Schottky barrier at semiconductor-metal interface.

    本文言語英語
    ホスト出版物のタイトル2015 4th International Conference on Informatics, Electronics and Vision, ICIEV 2015
    出版社Institute of Electrical and Electronics Engineers Inc.
    ISBN(電子版)9781467369022
    DOI
    出版ステータス出版済み - 11 20 2015
    イベント4th International Conference on Informatics, Electronics and Vision, ICIEV 2015 - Fukuoka, 日本
    継続期間: 6 15 20156 18 2015

    出版物シリーズ

    名前2015 4th International Conference on Informatics, Electronics and Vision, ICIEV 2015

    その他

    その他4th International Conference on Informatics, Electronics and Vision, ICIEV 2015
    国/地域日本
    CityFukuoka
    Period6/15/156/18/15

    All Science Journal Classification (ASJC) codes

    • コンピュータ ビジョンおよびパターン認識
    • 情報システム
    • 電子工学および電気工学

    フィンガープリント

    「Surface structure study and structure determination of (√3 × √3)R 30° phase of Si-adsorption on Ni(111) by LEED」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

    引用スタイル