Synthesis of silica membranes by chemical vapor deposition using a dimethyldimethoxysilane precursor

S. Ted Oyama, Haruki Aono, Atsushi Takagaki, Takashi Sugawara, Ryuji Kikuchi

    研究成果: Contribution to journalArticle査読

    4 被引用数 (Scopus)

    抄録

    Silica-based membranes prepared by chemical vapor deposition of tetraethylorthosilicate (TEOS) on γ-alumina overlayers are known to be effective for hydrogen separation and are attractive for membrane reactor applications for hydrogen-producing reactions. In this study, the synthesis of the membranes was improved by simplifying the deposition of the intermediate γ-alumina layers and by using the precursor, dimethyldimethoxysilane (DMDMOS). In the placement of the γ-alumina layers, earlier work in our laboratory employed four to five dipping-calcining cycles of boehmite sol precursors to produce high H2 selectivities, but this took considerable time. In the present study, only two cycles were needed, even for a macro-porous support, through the use of finer boehmite precursor particle sizes. Using the simplified fabrication process, silica-alumina composite membranes with H2 permeance > 10−7 mol m−2 s−1 Pa−1 and H2 /N2 selectivity >100 were successfully synthesized. In addition, the use of the silica precursor, DMDMOS, further improved the H2 permeance without compromising the H2 /N2 selectivity. Pure DMDMOS membranes proved to be unstable against hydrothermal conditions, but the addition of aluminum tri-sec-butoxide (ATSB) improved the stability just like for conventional TEOS membranes.

    本文言語英語
    論文番号50
    ジャーナルMembranes
    10
    3
    DOI
    出版ステータス出版済み - 3 2020

    All Science Journal Classification (ASJC) codes

    • 化学工学(その他)
    • プロセス化学およびプロセス工学
    • ろ過および分離

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