Technology mapping technique for enhancing throughput of multi-column-cell systems

Makoto Sugihara, Yusuke Matsunaga, Kazuaki Murakami

研究成果: ジャーナルへの寄稿Conference article

4 引用 (Scopus)

抄録

The character projection (CP) lithography is utilized for maskless lithography (ML2) and is a potential for the future photomask manufacture. The drawback of the electron beam (EB) lithography is its low throughput and leads to a rise in IC prices. The number of EB shots to project an IC chip determines the fabrication time and the amortization cost and must be reduced. A multi-column-cell (MCC) system is a lithographic one in which column-cells can independently project patterns onto a silicon wafer in parallel with the CP and variable shaped beam (VSB) lithographies. This paper presents a technology mapping technique for enhancing the throughput of MCC systems. Our technique enhances the throughput of MCC systems by reducing the number of EB shots to project an entire IC chip. The target MCC system for which our technology mapping optimizes a circuit is the one which has not uniform but multiform CP masks among column-cells. Such an MCC system can project more cell functions with the CP than a uniform CP masks-based system. Comparing with an conventional technique, our technique has achieved a 19.8% smaller number of EB shots without any performance degradation of ICs under a timing constraint. Moreover, our technique has achieved a 33.4% smaller number of EB shots under no performance constraints. Our technique is easy for both IC designers and equipment developers to adopt because it is a software approach with no additional modification on character projection equipment.

元の言語英語
記事番号65170Z
ジャーナルProceedings of SPIE - The International Society for Optical Engineering
6517
発行部数PART 1
DOI
出版物ステータス出版済み - 10 15 2007
イベントEmerging Lithographic Technologies XI - San Jose, CA, 米国
継続期間: 2 27 20073 1 2007

Fingerprint

Electron beams
Throughput
projection
Cell
Projection
Electron Beam
cells
Lithography
shot
electron beams
Masks
Photomasks
lithography
Electron beam lithography
Silicon wafers
Mask
Chip
masks
chips
Maskless Lithography

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

これを引用

Technology mapping technique for enhancing throughput of multi-column-cell systems. / Sugihara, Makoto; Matsunaga, Yusuke; Murakami, Kazuaki.

:: Proceedings of SPIE - The International Society for Optical Engineering, 巻 6517, 番号 PART 1, 65170Z, 15.10.2007.

研究成果: ジャーナルへの寄稿Conference article

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