Temperature dependent epitaxial growth of ferromagnetic silicide Fe3Si on Ge substrate

Koji Ueda, Taizoh Sadoh, Yuichiro Ando, Takahumi Jonishi, Kazumasa Narumi, Yoshihito Maeda, Masanobu Miyao

研究成果: Contribution to journalArticle査読

4 被引用数 (Scopus)

抄録

Influences of growth temperature on low-temperature (60-400 °C) molecular beam epitaxy of the ferromagnetic silicide Fe3Si layer on Ge substrates were investigated. X-ray diffraction and reflective high-energy electron diffraction measurements suggested that Fe3Si layers were epitaxially grown on Ge at a temperature between 60 and 300 °C, while another phase layer was epitaxially grown at 400 °C. Rutherford backscattering spectroscopy measurements revealed that Ge atoms began to diffuse into the Fe3Si layers above 300 °C, and the FeSiGe layer was formed at 400 °C. As a result, very low value (4.0%) of the minimum scattering yield (χmin) of the Fe3Si layers was obtained at 130 °C. Transmission electron microscopy measurements indicated that the interface of Fe3Si and Ge was atomically flat. In addition, analysis of the electron diffraction patterns of epitaxial Fe3Si layers confirmed the formation of DO3-type Fe3Si.

本文言語英語
ページ(範囲)422-424
ページ数3
ジャーナルThin Solid Films
517
1
DOI
出版ステータス出版済み - 11 3 2008

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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