The characteristics of multilayer thin films deposited with metal thin films (Ag, Al, Cu)

Dong Hun Kim, Ri Ichi Murakami, Yun Hae Kim, Kyung Man Moon, Seung Jun An, Tae Hyun Kim, Pang Pang Wang

    研究成果: Chapter in Book/Report/Conference proceedingConference contribution

    5 被引用数 (Scopus)

    抄録

    In order to study the characteristics of multilayer thin films with a ZnO/ metal/ ZnO structure the manufacture of the thin films was performed by a dc (direct current) magnetron sputtering system on slide glass substrates. The ZnO thin films were manufactured with the thicknesses of 30 nm and 50 nm. Three kinds of metals (Ag, Al and Cu) were deposited with the thicknesses of 4 nm, 8 nm, 12 nm and 16 nm. The electrical and optical properties of the manufactured thin films were then observed. As a result, the multilayer thin films with an Ag layer represented the most excellent electrical conductivity. This is due to the difference in the fundamental electrical properties of each of the metals. The structures of the metal particles deposited on the ZnO thin films were observed by an SEM (scanning electron microscope). The thin films exhibited a continuous structure with regular spaces between the metal particles. This resulted in an increase of transmittance. This is considered by the decrease of scattering and of light absorption on thin films with a continuous structure.

    本文言語英語
    ホスト出版物のタイトルManufacturing Science and Engineering I
    ページ1768-1771
    ページ数4
    DOI
    出版ステータス出版済み - 4 22 2010
    イベント2009 International Conference on Manufacturing Science and Engineering, ICMSE 2009 - Zhuhai, 中国
    継続期間: 12 26 200912 28 2009

    出版物シリーズ

    名前Advanced Materials Research
    97-101
    ISSN(印刷版)1022-6680

    その他

    その他2009 International Conference on Manufacturing Science and Engineering, ICMSE 2009
    国/地域中国
    CityZhuhai
    Period12/26/0912/28/09

    All Science Journal Classification (ASJC) codes

    • 工学(全般)

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