The origin of changes in electrical properties of organic films fabricated at various vacuum-deposition rates

Amir Mikaeili, Toshinori Matsushima, Yu Esaki, Sahar Alasvand Yazdani, Chihaya Adachi, Ezeddin Mohajerani

研究成果: Contribution to journalArticle査読

8 被引用数 (Scopus)

抄録

We investigated the dependence of electrical properties on vacuum-deposition rate for films of N,N՛-diphenyl-N,N՛-bis(1-naphthyl)-1,1՛-biphenyl-4,4՛-diamine (α-NPD) and tris-(8-hydroxyquinoline)aluminium (Alq 3 ), hole- and electron-transport materials widely used in organic light-emitting diodes (OLEDs), respectively. Hole-only devices (HODs) of α-NPD showed an increase of hole current when α-NPD layers were fabricated at high deposition rates, while the tendency was opposite for electron-only devices (EODs) of Alq 3 . We found that the increased hole current at high deposition rates for HODs was caused by a horizontal orientation of α-NPD molecules relative to a substrate plane which facilitates hole transport through the films. On the other hand, the decreased electron current at high deposition rates for EODs could be ascribed to the increased surface roughness of Alq 3 films which decreases electron injection. Additionally, we demonstrated that long-term operational stability was enhanced for HODs fabricated at high deposition rates and operated at a constant current. Use of a high deposition rate means a reduction of deposition time which is helpful in OLED manufacturing. The improved device performance when high deposition rates were used and the detailed understanding of its origins as we demonstrated here would lead to fabrication of high-performance OLEDs at a low cost in the future.

本文言語英語
ページ(範囲)93-100
ページ数8
ジャーナルOptical Materials
91
DOI
出版ステータス出版済み - 5 2019

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • コンピュータ サイエンス(全般)
  • 原子分子物理学および光学
  • 分光学
  • 物理化学および理論化学
  • 有機化学
  • 無機化学
  • 電子工学および電気工学

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