The reason why thin-film silicon grows layer by layer in plasma-enhanced chemical vapor deposition
Takuya Kuwahara, Hiroshi Ito, Kentaro Kawaguchi, Yuji Higuchi, Nobuki Ozawa, Momoji Kubo
研究成果: ジャーナルへの寄稿 › 学術誌 › 査読
13
被引用数
(Scopus)