Thickness dependence of microphase-separated structure of polyurethane ultrathin films

Yoshitaka Mitsui, Yusuke Uchiba, Suguru Motokucho, Ken Kojio, Mutsuhisa Furukawa

研究成果: 会議への寄与タイプ論文

抄録

Polyurethane ultrathin films with two hard segment contents (20 and 45 wt%) were prepared onto a silicon wafer by a spin coating method. The change in microphase separation of polyurethane ultrathin films was investigated by fourier transform infrared (FT-IR) spectroscopy x-ray photoelectron spectroscopy (XPS) and atomic forced microscopy (AFM) as a function of film thickness and hard segment content. FT-IR measurement revealed that hydrogen bonded hard segment chains orient perpendicular to the film surface for the ultrathin film (∼6 nm). The size of hard segment domains for the ultrathin film decreased with decrease in film thickness. This is due to confinement effect because the film thickness itself (∼6 nm) is much smaller than the domain size (20 nm) formed in the bulk PUEs.

元の言語英語
ページ4318-4319
ページ数2
出版物ステータス出版済み - 12 1 2005
イベント54th SPSJ Symposium on Macromolecules - Yamagata, 日本
継続期間: 9 20 20059 22 2005

その他

その他54th SPSJ Symposium on Macromolecules
日本
Yamagata
期間9/20/059/22/05

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Microphase separation
Ultrathin films
Silicon wafers
Phase separation
Polyurethanes
Fourier transform infrared spectroscopy
Atomic force microscopy
X ray photoelectron spectroscopy
Film thickness
Spin coating
Photoelectron spectroscopy
Fourier transforms
Microscopic examination
Infrared radiation
X rays
Hydrogen

All Science Journal Classification (ASJC) codes

  • Engineering(all)

これを引用

Mitsui, Y., Uchiba, Y., Motokucho, S., Kojio, K., & Furukawa, M. (2005). Thickness dependence of microphase-separated structure of polyurethane ultrathin films. 4318-4319. 論文発表場所 54th SPSJ Symposium on Macromolecules, Yamagata, 日本.

Thickness dependence of microphase-separated structure of polyurethane ultrathin films. / Mitsui, Yoshitaka; Uchiba, Yusuke; Motokucho, Suguru; Kojio, Ken; Furukawa, Mutsuhisa.

2005. 4318-4319 論文発表場所 54th SPSJ Symposium on Macromolecules, Yamagata, 日本.

研究成果: 会議への寄与タイプ論文

Mitsui, Y, Uchiba, Y, Motokucho, S, Kojio, K & Furukawa, M 2005, 'Thickness dependence of microphase-separated structure of polyurethane ultrathin films' 論文発表場所 54th SPSJ Symposium on Macromolecules, Yamagata, 日本, 9/20/05 - 9/22/05, pp. 4318-4319.
Mitsui Y, Uchiba Y, Motokucho S, Kojio K, Furukawa M. Thickness dependence of microphase-separated structure of polyurethane ultrathin films. 2005. 論文発表場所 54th SPSJ Symposium on Macromolecules, Yamagata, 日本.
Mitsui, Yoshitaka ; Uchiba, Yusuke ; Motokucho, Suguru ; Kojio, Ken ; Furukawa, Mutsuhisa. / Thickness dependence of microphase-separated structure of polyurethane ultrathin films. 論文発表場所 54th SPSJ Symposium on Macromolecules, Yamagata, 日本.2 p.
@conference{8d33bd872bff474ca0af717db20fda8b,
title = "Thickness dependence of microphase-separated structure of polyurethane ultrathin films",
abstract = "Polyurethane ultrathin films with two hard segment contents (20 and 45 wt{\%}) were prepared onto a silicon wafer by a spin coating method. The change in microphase separation of polyurethane ultrathin films was investigated by fourier transform infrared (FT-IR) spectroscopy x-ray photoelectron spectroscopy (XPS) and atomic forced microscopy (AFM) as a function of film thickness and hard segment content. FT-IR measurement revealed that hydrogen bonded hard segment chains orient perpendicular to the film surface for the ultrathin film (∼6 nm). The size of hard segment domains for the ultrathin film decreased with decrease in film thickness. This is due to confinement effect because the film thickness itself (∼6 nm) is much smaller than the domain size (20 nm) formed in the bulk PUEs.",
author = "Yoshitaka Mitsui and Yusuke Uchiba and Suguru Motokucho and Ken Kojio and Mutsuhisa Furukawa",
year = "2005",
month = "12",
day = "1",
language = "English",
pages = "4318--4319",
note = "54th SPSJ Symposium on Macromolecules ; Conference date: 20-09-2005 Through 22-09-2005",

}

TY - CONF

T1 - Thickness dependence of microphase-separated structure of polyurethane ultrathin films

AU - Mitsui, Yoshitaka

AU - Uchiba, Yusuke

AU - Motokucho, Suguru

AU - Kojio, Ken

AU - Furukawa, Mutsuhisa

PY - 2005/12/1

Y1 - 2005/12/1

N2 - Polyurethane ultrathin films with two hard segment contents (20 and 45 wt%) were prepared onto a silicon wafer by a spin coating method. The change in microphase separation of polyurethane ultrathin films was investigated by fourier transform infrared (FT-IR) spectroscopy x-ray photoelectron spectroscopy (XPS) and atomic forced microscopy (AFM) as a function of film thickness and hard segment content. FT-IR measurement revealed that hydrogen bonded hard segment chains orient perpendicular to the film surface for the ultrathin film (∼6 nm). The size of hard segment domains for the ultrathin film decreased with decrease in film thickness. This is due to confinement effect because the film thickness itself (∼6 nm) is much smaller than the domain size (20 nm) formed in the bulk PUEs.

AB - Polyurethane ultrathin films with two hard segment contents (20 and 45 wt%) were prepared onto a silicon wafer by a spin coating method. The change in microphase separation of polyurethane ultrathin films was investigated by fourier transform infrared (FT-IR) spectroscopy x-ray photoelectron spectroscopy (XPS) and atomic forced microscopy (AFM) as a function of film thickness and hard segment content. FT-IR measurement revealed that hydrogen bonded hard segment chains orient perpendicular to the film surface for the ultrathin film (∼6 nm). The size of hard segment domains for the ultrathin film decreased with decrease in film thickness. This is due to confinement effect because the film thickness itself (∼6 nm) is much smaller than the domain size (20 nm) formed in the bulk PUEs.

UR - http://www.scopus.com/inward/record.url?scp=33645567129&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33645567129&partnerID=8YFLogxK

M3 - Paper

SP - 4318

EP - 4319

ER -