Thickness dependence of microphase-separated structure of polyurethane ultrathin films

Yoshitaka Mitsui, Yusuke Uchiba, Suguru Motokucho, Ken Kojio, Mutsuhisa Furukawa

研究成果: Contribution to conferencePaper査読

抄録

Polyurethane ultrathin films with two hard segment contents (20 and 45 wt%) were prepared onto a silicon wafer by a spin coating method. The change in microphase separation of polyurethane ultrathin films was investigated by fourier transform infrared (FT-IR) spectroscopy x-ray photoelectron spectroscopy (XPS) and atomic forced microscopy (AFM) as a function of film thickness and hard segment content. FT-IR measurement revealed that hydrogen bonded hard segment chains orient perpendicular to the film surface for the ultrathin film (∼6 nm). The size of hard segment domains for the ultrathin film decreased with decrease in film thickness. This is due to confinement effect because the film thickness itself (∼6 nm) is much smaller than the domain size (20 nm) formed in the bulk PUEs.

本文言語英語
ページ4318-4319
ページ数2
出版ステータス出版済み - 12 1 2005
外部発表はい
イベント54th SPSJ Symposium on Macromolecules - Yamagata, 日本
継続期間: 9 20 20059 22 2005

その他

その他54th SPSJ Symposium on Macromolecules
国/地域日本
CityYamagata
Period9/20/059/22/05

All Science Journal Classification (ASJC) codes

  • 工学(全般)

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