Threshold conditions for bulk second-order nonlinearity and near-surface second-order nonlinearity in thermally poled infrasil silica

Mingxin Qiu, Toru Mizunami, Teruo Shimomura, Michitaka Ohtaki

    研究成果: Contribution to journalArticle

    4 引用 (Scopus)

    抜粋

    Generation of bulk second-order nonlinearity in silica glass requires higher poling temperature or longer poling time than that of near-surface second-order nonlinearity. The threshold conditions for initiating the bulk second-order nonlinearity are studied on Infrasil fused silica glass. The threshold poling time is strongly dependent on the poling temperature. The near-surface second-order nonlinearity is also studied, especially the dependence of thickness of the nonlinear layer on the poling temperature, poling voltage and poling time. Secondary-ion mass-spectroscopy measurement showed depletion of Na+ ions at the anodic surface. We assume there is an ionic wave during poling traveling from the anodic surface to generate the dipolar electric field that induces the near-surface second-order nonlinearity.

    元の言語英語
    ページ(範囲)159-162
    ページ数4
    ジャーナルOptical Review
    8
    発行部数3
    DOI
    出版物ステータス出版済み - 2001

    All Science Journal Classification (ASJC) codes

    • Atomic and Molecular Physics, and Optics

    フィンガープリント Threshold conditions for bulk second-order nonlinearity and near-surface second-order nonlinearity in thermally poled infrasil silica' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用