Transparent deoxyribonucleic acid substrate with high mechanical strength for flexible and biocompatible organic resistive memory devices

Chien Chung Shih; Cheng Yu Chung; Jeun Yan Lam; Hung Chin Wu; Yuma Morimitsu; Hisao Matsuno; Keiji Tanaka; Wen Chang Chen

doi:10.1039/c6cc07648c

Transparent deoxyribonucleic acid substrate with high mechanical strength for flexible and biocompatible organic resistive memory devices

Chien Chung Shih, Cheng Yu Chung, Jeun Yan Lam, Hung Chin Wu, Yuma Morimitsu, Hisao Matsuno, Keiji Tanaka, Wen Chang Chen

機能物質化学

研究成果: ジャーナルへの寄稿 › 学術誌 › 査読

23 被引用数 (Scopus)

抄録

Biocompatible deoxyribonucleic acid (DNA), with high mechanical strength, was employed as the substrate for a Ag nanowire (Ag NW) pattern and then used to fabricate flexible resistor-type memory devices. The memory exhibited typical write-once-read-many (WORM)-type memory features with a high ON/OFF ratio (10⁴), long-term retention ability (10⁴ s) and excellent mechanical endurance.

本文言語	英語
ページ（範囲）	13463-13466
ページ数	4
ジャーナル	Chemical Communications
巻	52
号	92
DOI	https://doi.org/10.1039/c6cc07648c
出版ステータス	出版済み - 1月 1 2016

!!!All Science Journal Classification (ASJC) codes

触媒
電子材料、光学材料、および磁性材料
セラミックおよび複合材料
化学 (全般)
表面、皮膜および薄膜
金属および合金
材料化学

文献へのアクセス

10.1039/c6cc07648c

他のファイルとリンク

フィンガープリント

「Transparent deoxyribonucleic acid substrate with high mechanical strength for flexible and biocompatible organic resistive memory devices」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル

@article{b12d7b6d0ee9418183647dfbefa3bffc,

title = "Transparent deoxyribonucleic acid substrate with high mechanical strength for flexible and biocompatible organic resistive memory devices",

abstract = "Biocompatible deoxyribonucleic acid (DNA), with high mechanical strength, was employed as the substrate for a Ag nanowire (Ag NW) pattern and then used to fabricate flexible resistor-type memory devices. The memory exhibited typical write-once-read-many (WORM)-type memory features with a high ON/OFF ratio (104), long-term retention ability (104 s) and excellent mechanical endurance.",

author = "Shih, {Chien Chung} and Chung, {Cheng Yu} and Lam, {Jeun Yan} and Wu, {Hung Chin} and Yuma Morimitsu and Hisao Matsuno and Keiji Tanaka and Chen, {Wen Chang}",

year = "2016",

month = jan,

day = "1",

doi = "10.1039/c6cc07648c",

language = "English",

volume = "52",

pages = "13463--13466",

journal = "Chemical Communications",

issn = "1359-7345",

publisher = "Royal Society of Chemistry",

number = "92",

}

TY - JOUR

T1 - Transparent deoxyribonucleic acid substrate with high mechanical strength for flexible and biocompatible organic resistive memory devices

AU - Shih, Chien Chung

AU - Chung, Cheng Yu

AU - Lam, Jeun Yan

AU - Wu, Hung Chin

AU - Morimitsu, Yuma

AU - Matsuno, Hisao

AU - Tanaka, Keiji

AU - Chen, Wen Chang

PY - 2016/1/1

Y1 - 2016/1/1

N2 - Biocompatible deoxyribonucleic acid (DNA), with high mechanical strength, was employed as the substrate for a Ag nanowire (Ag NW) pattern and then used to fabricate flexible resistor-type memory devices. The memory exhibited typical write-once-read-many (WORM)-type memory features with a high ON/OFF ratio (104), long-term retention ability (104 s) and excellent mechanical endurance.

AB - Biocompatible deoxyribonucleic acid (DNA), with high mechanical strength, was employed as the substrate for a Ag nanowire (Ag NW) pattern and then used to fabricate flexible resistor-type memory devices. The memory exhibited typical write-once-read-many (WORM)-type memory features with a high ON/OFF ratio (104), long-term retention ability (104 s) and excellent mechanical endurance.

UR - http://www.scopus.com/inward/record.url?scp=84994804552&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84994804552&partnerID=8YFLogxK

U2 - 10.1039/c6cc07648c

DO - 10.1039/c6cc07648c

M3 - Article

C2 - 27790662

AN - SCOPUS:84994804552

VL - 52

SP - 13463

EP - 13466

JO - Chemical Communications

JF - Chemical Communications

SN - 1359-7345

IS - 92

ER -