Two dimensional simulations of triode VHF SiH 4 plasma

Li Wen Su, Weiting Chen, Kiichiro Uchino, Yoshinobu Kawai

研究成果: ジャーナルへの寄稿記事

抄録

Two-dimensional simulations of a triode VHF SiH 4 plasma (60 MHz) were performed using a fluid model, where the plasma was realized using multirod electrodes. Higher-order silanes that are responsible for the quality of amorphous silicon were included in the simulations. A typical VHF plasma with an electron density higher than 10 16 m %3 and an electron temperature lower than 3 eV was predicted between discharge electrodes while the electron density near the substrate was very low. The SiH 3 density was fairly uniform between discharge electrodes and did not decrease rapidly near the substrate, suggesting a high-speed deposition. Higher-order molecules and radicals that play an important role in dust formation had similar spatial profiles and their densities were five to 6 orders of magnitude lower than the SiH 3 density. We discussed the effect of the rate constant of reaction, SiH 3 + SiH 3 G SiH 2 + SiH 4 , on the SiH 3 density.

元の言語英語
記事番号06JG01
ジャーナルJapanese Journal of Applied Physics
57
発行部数6
DOI
出版物ステータス出版済み - 6 1 2018

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Triodes
triodes
Plasmas
Electrodes
Carrier concentration
electrodes
simulation
Electron temperature
Substrates
Amorphous silicon
Silanes
Dust
Rate constants
silanes
amorphous silicon
Molecules
Fluids
dust
high speed
electron energy

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

これを引用

Two dimensional simulations of triode VHF SiH 4 plasma . / Su, Li Wen; Chen, Weiting; Uchino, Kiichiro; Kawai, Yoshinobu.

:: Japanese Journal of Applied Physics, 巻 57, 番号 6, 06JG01, 01.06.2018.

研究成果: ジャーナルへの寄稿記事

Su, Li Wen ; Chen, Weiting ; Uchino, Kiichiro ; Kawai, Yoshinobu. / Two dimensional simulations of triode VHF SiH 4 plasma :: Japanese Journal of Applied Physics. 2018 ; 巻 57, 番号 6.
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