VHF SiH4/H2 plasma characteristics with negative ions

Tsukasa Yamane, Sachiko Nakao, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai

研究成果: ジャーナルへの寄稿記事

1 引用 (Scopus)

抜粋

A VHF SiH4/H2 plasma was produced using a multi rod electrode and the plasma parameters were measured using a heated Langmuir probe, where the frequency of the power source was 80MHz. The Langmuir probe characteristics indicated that when the concentration of SiH4/H2 is increased, negative ions appear and at the same time the electron temperature increases.

元の言語英語
ページ(範囲)S433-S436
ジャーナルSurface and Coatings Technology
228
発行部数SUPPL.1
DOI
出版物ステータス出版済み - 8 15 2013

    フィンガープリント

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

これを引用

Yamane, T., Nakao, S., Takeuchi, Y., Yamauchi, Y., Takatsuka, H., Muta, H., ... Kawai, Y. (2013). VHF SiH4/H2 plasma characteristics with negative ions. Surface and Coatings Technology, 228(SUPPL.1), S433-S436. https://doi.org/10.1016/j.surfcoat.2012.05.036