Visualization of active surface molecular motion in polystyrene film by scanning viscoelasticity microscopy

Keiji Tanaka, Kohsuke Hashimoto, Tisato Kajiyama, Atsushi Takahara

研究成果: ジャーナルへの寄稿記事

45 引用 (Scopus)

抄録

A monodisperse polystyrene (PS) film was spin-coated on a silicon wafer with native oxide layer and was in part scratched by a blade. Then, the surface modulus on a given area, in which PS and bared silicon were present, was two-dimensionally mapped as a function of temperature by scanning viscoelasticity microscopy. We visually present evidence that the PS surface started to soften up at a temperature much lower than the bulk glass transition temperature.

元の言語英語
ページ(範囲)6573-6575
ページ数3
ジャーナルLangmuir
19
発行部数17
DOI
出版物ステータス出版済み - 8 19 2003

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Polystyrenes
viscoelasticity
Viscoelasticity
polystyrene
Microscopic examination
Visualization
microscopy
Scanning
scanning
silicon
Silicon
blades
Silicon wafers
Oxides
glass transition temperature
wafers
Temperature
oxides
temperature

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

これを引用

Visualization of active surface molecular motion in polystyrene film by scanning viscoelasticity microscopy. / Tanaka, Keiji; Hashimoto, Kohsuke; Kajiyama, Tisato; Takahara, Atsushi.

:: Langmuir, 巻 19, 番号 17, 19.08.2003, p. 6573-6575.

研究成果: ジャーナルへの寄稿記事

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